发明申请
US20070149702A1 Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same
有权
适用于酸产生剂的树脂和含有它的化学放大型正性抗蚀剂组合物
- 专利标题： Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same
- 专利标题（中）： 适用于酸产生剂的树脂和含有它的化学放大型正性抗蚀剂组合物
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申请号： US11642628申请日： 2006-12-21
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公开(公告)号： US20070149702A1公开(公告)日： 2007-06-28
- 发明人: Nobuo Ando , Ichiki Takemoto , Isao Yoshida , Yukako Harada
- 申请人： Nobuo Ando , Ichiki Takemoto , Isao Yoshida , Yukako Harada
- 专利权人： Sumitomo Chemical Company, Limited
- 当前专利权人： Sumitomo Chemical Company, Limited
- 优先权： JP2005-374255 20051227
- 主分类号： C09D5/02
- IPC分类号： C09D5/02
摘要：
The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.
公开/授权文献
- US07932334B2 Resin suitable for an acid generator 公开/授权日：2011-04-26
信息查询
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