发明申请
- 专利标题： Polishing pad and method for manufacturing the polishing pad
- 专利标题（中）： 抛光垫及抛光垫的制造方法
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申请号： US11323651申请日： 2005-12-30
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公开(公告)号： US20070155268A1公开(公告)日： 2007-07-05
- 发明人: Chung-Ching Feng , Chen-Hsiang Chao , I-Peng Yao , Yung-Chang Hung , Jyh-Jen Lee
- 申请人： Chung-Ching Feng , Chen-Hsiang Chao , I-Peng Yao , Yung-Chang Hung , Jyh-Jen Lee
- 申请人地址： TW Jenwu Shiang
- 专利权人： SAN FANG CHEMICAL INDUSTRY CO., LTD.
- 当前专利权人： SAN FANG CHEMICAL INDUSTRY CO., LTD.
- 当前专利权人地址： TW Jenwu Shiang
- 主分类号： B32B27/04
- IPC分类号： B32B27/04
摘要：
A polishing pad includes a non-woven cloth and a continuous porous polymer. The non-woven cloth includes fibers. The polymer includes a plurality of holes communicated with one another. The polymer is cured in and bonded to the non-woven cloth. A surface of the polishing pad is constituted by the fibers of the non-woven cloth and the polymer.
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