Invention Application
- Patent Title: Substrate processing including a masking layer
- Patent Title (中): 衬底处理包括掩模层
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Application No.: US11647882Application Date: 2006-12-29
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Publication No.: US20070166989A1Publication Date: 2007-07-19
- Inventor: Zachary Fresco , Chi-I Lang , Sandra Malhotra , Tony Chiang , Thomas Boussie , Nitin Kumar , Jinhong Tong , Anh Duong
- Applicant: Zachary Fresco , Chi-I Lang , Sandra Malhotra , Tony Chiang , Thomas Boussie , Nitin Kumar , Jinhong Tong , Anh Duong
- Assignee: Intermolecular, Inc.
- Current Assignee: Intermolecular, Inc.
- Main IPC: H01L21/44
- IPC: H01L21/44 ; H01L21/4763 ; H01L21/31
Abstract:
Methods for substrate processing are described. The methods include forming a material layer on a substrate. The methods include selecting constituents of a molecular masking layer (MML) to remove an effect of variations in the material layer as a result of substrate processing. The methods include normalizing the surface characteristics of the material layer by selectively depositing the MML on the material layer.
Public/Granted literature
- US07879710B2 Substrate processing including a masking layer Public/Granted day:2011-02-01
Information query
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