Invention Application
- Patent Title: PATTERN FORMING METHOD AND PATTERN FORMING SYSTEM
- Patent Title (中): 图形形成方法和图案形成系统
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Application No.: US11626402Application Date: 2007-01-24
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Publication No.: US20070172967A1Publication Date: 2007-07-26
- Inventor: Souichi Katagiri , Yasunari Sohda , Masahiko Ogino
- Applicant: Souichi Katagiri , Yasunari Sohda , Masahiko Ogino
- Priority: JP2006-014525 20060124
- Main IPC: H01L21/66
- IPC: H01L21/66

Abstract:
Method of forming a pattern by a nanoimprint technique starts with preparing a mold with nanostructures on its surface. The mold is pressed against a substrate or plate coated with a resin film. The positions of alignment marks formed on the rear surface of the plate coated with the resin film are detected. Thus, a relative alignment between the mold and the plate coated with the resin film is performed.
Public/Granted literature
- US07745237B2 Pattern forming method and pattern forming system Public/Granted day:2010-06-29
Information query
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