Invention Application
US20070172967A1 PATTERN FORMING METHOD AND PATTERN FORMING SYSTEM 有权
图形形成方法和图案形成系统

PATTERN FORMING METHOD AND PATTERN FORMING SYSTEM
Abstract:
Method of forming a pattern by a nanoimprint technique starts with preparing a mold with nanostructures on its surface. The mold is pressed against a substrate or plate coated with a resin film. The positions of alignment marks formed on the rear surface of the plate coated with the resin film are detected. Thus, a relative alignment between the mold and the plate coated with the resin film is performed.
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