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公开(公告)号：US08268209B2
公开(公告)日：2012-09-18
申请号：US11623776
申请日：2007-01-17
申请人： Masahiko Ogino , Akihiro Miyauchi , Takashi Ando , Chiseki Haginoya , Susumu Komoriya , Yasunari Sohda , Souichi Katagiri , Hiroya Ohta , Yoshinori Nakayama
发明人： Masahiko Ogino , Akihiro Miyauchi , Takashi Ando , Chiseki Haginoya , Susumu Komoriya , Yasunari Sohda , Souichi Katagiri , Hiroya Ohta , Yoshinori Nakayama
IPC分类号： H01L23/544
CPC分类号： H01L21/76838 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7076 , G11B5/855 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： In a mold in which a pattern is formed of a fine concavo-convex shape, two or more of alignment marks for determining a relative positional relation between a substrate and a mold are formed concentrically. Moreover, a damaged mark is identified from the positional information and shape of the respective marks, and an alignment between the mold and the substrate to which a resin film is applied is carried out excluding the damaged mark.
摘要翻译： 在图案形成为微细凹凸形状的模具中，同心地形成用于确定基板和模具之间的相对位置关系的两个或更多个对准标记。 此外，根据各个标记的位置信息和形状来识别损坏的标记，并且除了损坏的标记之外，执行模具和施加了树脂膜的基板之间的对准。
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公开(公告)号：US20080315122A1
公开(公告)日：2008-12-25
申请号：US12127030
申请日：2008-05-27
申请人： Souichi Katagiri , Takashi Ohshima
发明人： Souichi Katagiri , Takashi Ohshima
IPC分类号： H01J37/02
CPC分类号： H01J37/28 , H01J37/18 , H01J37/3056 , H01J2237/182 , H01J2237/1825
摘要： The present invention provides a charged particle beam system which can perform evacuation on an electron gun chamber or an ion-gun chamber having a non-evaporable getter pump in a short time and can maintain the ultra-high vacuum for a long time, and a technology of evacuation therefor. Provided is a charged particle beam system equipped with a charged particle optics which makes the charged particle beam emitted from a charged particle source incident on a sample and means of evacuation for evacuating the charged particle optics, characterized in that the evaporation means has: a vacuum vessel with a charged particle source disposed in the vessel; a non-evaporable getter pump which connects with the vacuum vessel through a vacuum pipe and evacuates the interior of the vacuum vessel as a subsidiary vacuum pump; a valve interposed in the vacuum pipe connecting between the vacuum vessel and the non-evaporable getter pump; a rough pumping port which is provided closer to the non-evaporable getter pump than the valve and performs rough pumping; an open and shut valve for opening and shutting the rough pumping port; and a main vacuum pump which is provided closer to the vacuum vessel than the valve and evacuates the interior of the vacuum vessel.
摘要翻译： 本发明提供了一种带电粒子束系统，其能够在短时间内在具有不可蒸发的吸气泵的电子枪室或离子枪室上进行排气并且能够长时间保持超高真空， 撤离技术。 提供了一种装有带电粒子光学器件的带电粒子束系统，其使从入射到样品上的带电粒子源发射的带电粒子束和抽空装置用于抽空带电粒子光学器件，其特征在于，蒸发装置具有：真空 具有设置在容器中的带电粒子源的容器; 一个不可蒸发的吸气泵，通过一个真空管与真空容器相连，抽真空真空容器的内部作为辅助真空泵; 插入在真空容器和不可蒸发的吸气剂泵之间的真空管中的阀; 一个粗略的抽气口，比阀门更靠近不可蒸发的吸气泵，进行粗抽; 用于打开和关闭粗抽泵口的打开和关闭阀; 以及主真空泵，其设置成比阀更靠近真空容器并排空真空容器的内部。
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3.发明申请公开(公告)号：US20050221608A1
公开(公告)日：2005-10-06
申请号：US11133300
申请日：2005-05-20
申请人： Souichi Katagiri , Ui Yamaguchi
发明人： Souichi Katagiri , Ui Yamaguchi
IPC分类号： B23H5/08 , B24B37/04 , C25F3/14 , C25F7/00 , H01L21/304 , H01L21/3205 , H01L21/321 , H01L21/768 , H01L21/4763
CPC分类号： B23H5/08 , B24B37/04 , C25F3/14 , C25F7/00 , H01L21/32125 , H01L21/7684
摘要： The object of the invention is to provide a method of manufacturing a semiconductor device and a processing apparatus for planarization wherein to form copper wiring in multiple layers. The removal of a residue of polishing by local electro polishing, the enhancement of the performance of planarization by using a grindstone and the reduction by small frictional force in electro polishing of damage, are enabled. To achieve the object, the following measures are taken. A residue of polishing of copper is removed by combining the detection of a local area including the residue of polishing of copper and local processing for electro polishing. As small-load processing for planarization is enabled by using electro polishing, multilayer interconnection structure using low-k material as a dielectric interlayer is also enabled. Plural pairs of small unit electrodes in a pair of which minus electrodes surround a plus electrode are provided to a tool for electro polishing, each electrode is connected to a power supply, pulse voltage is applied to each electrode and copper is electrolytically polished.
摘要翻译： 本发明的目的是提供一种制造半导体器件的方法和用于平坦化的处理装置，其中以多层形成铜布线。 通过局部电抛光去除抛光残留物，通过使用磨石提高平面化性能以及通过小摩擦力在电抛光中减少损伤。 为达到此目的，采取以下措施。 通过组合检测包括铜的抛光残余物和局部电抛光的局部区域来去除铜的抛光残余物。 通过使用电抛光能够实现平面化的小负载处理，也可以使用低k材料作为电介质中间层的多层互连结构。 将一对负电极围绕正电极的多对小单元电极提供给用于电抛光的工具，每个电极连接到电源，脉冲电压施加到每个电极并且铜被电解抛光。
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公开(公告)号：US06723144B2
公开(公告)日：2004-04-20
申请号：US10308088
申请日：2002-12-03
申请人： Souichi Katagiri , Kan Yasui , Ryousei Kawai , Sadayuki Nishimura , Masahiko Sato , Yoshio Kawamura , Shigeo Moriyama
发明人： Souichi Katagiri , Kan Yasui , Ryousei Kawai , Sadayuki Nishimura , Masahiko Sato , Yoshio Kawamura , Shigeo Moriyama
IPC分类号： B24D302
CPC分类号： B24B37/245 , B24D3/32 , H01L21/31053 , H01L21/3212 , H01L21/76819 , H01L21/7684
摘要： A film formed on a surface of a wafer on which an integrated circuit is to be constructed can be planarized by using a fixed abrasive tool regardless of the width of elements of a pattern underlying the film. The fixed abrasive tool is liable to form scratches in the surface of the film. A planarizing process of the present invention employs a fixed abrasive tool containing substances harder than the film to be planarized in a content of 10 ppm or below and having a mean pore diameter of 0.2 &mgr;m or below.
摘要翻译： 形成在其上将要构造集成电路的晶片的表面上的膜可以通过使用固定的研磨工具进行平面化，而与薄膜下面的图案的元件的宽度无关。 固定的研磨工具易于在膜表面形成划痕。 本发明的平面化方法使用含有比待平坦化的膜更硬的物质的固定研磨工具，其含量为10ppm以下，平均孔径为0.2μm以下。
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公开(公告)号：US20130063029A1
公开(公告)日：2013-03-14
申请号：US13666119
申请日：2012-11-01
CPC分类号： H01J1/304 , H01J37/073 , H01J37/265 , H01J2237/022 , H01J2237/06325 , H01J2237/0653 , H01J2237/0656
摘要： Provided is a charged particle beam apparatus, which can emit a stable electron beam, having high brightness and a narrow energy width. The charged particle beam apparatus comprises a field emission electron source, electrodes for applying an electric field to the field emission electron source, and a vacuum exhaust unit for keeping the pressure around the field emission electron source at 1×10−8 Pa or less. The apparatus is so constituted as to use such one of the electron beams emitted as has an electron-beam-center radiation angle of 1×10−2sr or less, and to use the electric current thereof, the second order differentiation of which is negative or zero with respect to the time, and which reduces at a rate of 10% or less per hour. The charged particle beam apparatus further comprises a heating unit for the field emission electron source, and a detection unit for the electric current of the electron beam. The field emission electron source is repeatedly heated to keep the electric current of the electron beam to be emitted, at a predetermined value or higher.
摘要翻译： 提供一种带电粒子束装置，其能够发射具有高亮度和窄能量宽度的稳定电子束。 带电粒子束装置包括场发射电子源，用于向场发射电子源施加电场的电极和用于将场致发射电子源周围的压力保持在1×10 -8 Pa以下的真空排气单元。 该装置构成为使用发射的电子束中心辐射角为1×10-2sr以下的电子束，并使用其电流，其二阶微分为负 或相对于时间为零，并以每小时10％或更少的速率减少。 带电粒子束装置还包括用于场发射电子源的加热单元和用于电子束电流的检测单元。 重复加热场致发射电子源以使电子束的电流保持在规定值以上。
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公开(公告)号：US20120085925A1
公开(公告)日：2012-04-12
申请号：US13376473
申请日：2010-06-15
IPC分类号： G21K5/08
CPC分类号： H01J37/065 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/3174 , H01J2237/0206 , H01J2237/0213 , H01J2237/022 , H01J2237/06316 , H01J2237/06325 , H01J2237/06375 , H01J2237/2482
摘要： An electron gun that serves to reduce the quantity of electron stimulated desorption and accomplishes vacuum evacuation efficiently with a sufficient degree of vacuum. An electron source 1 and an extraction electrode 6 are provided for emitting an electron beam 7 from the electron source 1. A first vacuum chamber 16 containing the electron source 1 is connected to a second vacuum chamber 9 via an aperture 8 provided in the extraction electrode 6. Each vacuum chamber is differentially evacuated with an independent vacuum evacuation means, and the generation of electron stimulated desorption gas 11 is reduced by securing a wide route of vacuum evacuation around the electron source 1 and intercepting the procession of back scattered electrons 12 emitted from the area with the electron beam 7 on the extraction electrode 6 by using a shielding electrode 22 given a prescribed potential.
摘要翻译： 一种电子枪，其用于减少电子刺激的解吸量，并以足够的真空度有效地实现真空排气。 提供电子源1和提取电极6，用于从电子源1发射电子束7.包含电子源1的第一真空室16通过设置在引出电极中的孔8连接到第二真空室9 每个真空室用独立的真空排气装置进行差异抽真空，并且通过确保在电子源1周围的宽的真空排气路径并且截断从后面散射的电子12的排出而减少电子刺激的解吸气体11的产生 通过使用给定电位的屏蔽电极22，在引出电极6上具有电子束7的区域。
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公开(公告)号：US07582885B2
公开(公告)日：2009-09-01
申请号：US11401878
申请日：2006-04-12
IPC分类号： H01J1/50
CPC分类号： H01J41/14 , H01J37/28 , H01J41/12 , H01J2237/0245 , H01J2237/062 , H01J2237/06341 , H01J2237/1825
摘要： A small-sized charged particle beam apparatus capable of maintaining high vacuum even during emission of an electron beam is provided. A nonevaporative getter pump is placed upstream of differential pumping of an electron optical system of the charged particle beam apparatus, and a minimum number of ion pumps are placed downstream, so that both the pumps are used in combination. Further, by mounting a detachable coil on an electron gun part, the inside of a column can be maintained under high vacuum with a degree of vacuum in the order of 10−8 Pa.
摘要翻译： 提供即使在电子束的发射期间也能保持高真空的小尺寸带电粒子束装置。 将非蒸发性吸气泵放置在带电粒子束装置的电子光学系统的差分泵浦的上游，并且将最少数量的离子泵放置在下游，使得两个泵组合使用。 此外，通过将可拆卸线圈安装在电子枪部件上，可以将真空度保持在10-8Pa以下的真空度的高真空下。
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公开(公告)号：US20080067396A1
公开(公告)日：2008-03-20
申请号：US11749181
申请日：2007-05-16
IPC分类号： H01J1/50
CPC分类号： H01J37/143 , H01J37/28 , H01J2237/1405 , H01J2237/2813 , H01J2237/31749
摘要： The present invention provides a compact electron lens causing little aberration, and a charged particle beam apparatus such as a scanning electron microscope that is super compact and offers a high resolution. An upper magnetic pole and a sample-side magnetic pole are magnetically coupled to the respective poles of a permanent magnet that is made of a highly strong magnetic material such as a rare-earth cobalt system or a neodymium-iron-boron system, that is axially symmetrical, and that has a hole in the center thereof. An inner gap is created on the side of a center axis. Thus, a magnetic lens is formed axially. Moreover, a semi-stationary magnetic path that shields an outside magnetic field and has the magnetic reluctance thereof regulated is disposed outside. The sample-side magnetic pole and magnetic path defines a region where magnetic reluctance is the highest outside the permanent magnet. A space defined by the permanent magnet, upper magnetic pole, sample-die magnetic pole, and semi-stationary magnetic path is filled with a filling made of a non-magnetic material. Thus, an objective lens is constructed.
摘要翻译： 本发明提供一种产生很小像差的小型电子透镜，以及诸如扫描电子显微镜的带电粒子束装置，其具有超级紧凑并且提供高分辨率。 上磁极和样本侧磁极磁耦合到由诸如稀土钴体系或钕铁硼体系的高强度磁性材料制成的永磁体的各极上，即， 轴向对称，并且在其中心具有孔。 在中心轴的一侧产生内部间隙。 因此，磁性透镜轴向形成。 此外，将外部磁场屏蔽并具有调节磁阻的半静态磁路设置在外部。 样品侧磁极和磁路限定永磁体外磁阻最高的区域。 由永磁体，上磁极，样品芯磁极和半静态磁路限定的空间填充有由非磁性材料制成的填充物。 因此，构成物镜。
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公开(公告)号：US20070172967A1
公开(公告)日：2007-07-26
申请号：US11626402
申请日：2007-01-24
申请人： Souichi Katagiri , Yasunari Sohda , Masahiko Ogino
发明人： Souichi Katagiri , Yasunari Sohda , Masahiko Ogino
IPC分类号： H01L21/66
CPC分类号： G03F9/7049 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/703 , G03F9/7084 , G03F9/7088
摘要： Method of forming a pattern by a nanoimprint technique starts with preparing a mold with nanostructures on its surface. The mold is pressed against a substrate or plate coated with a resin film. The positions of alignment marks formed on the rear surface of the plate coated with the resin film are detected. Thus, a relative alignment between the mold and the plate coated with the resin film is performed.
摘要翻译： 通过纳米压印技术形成图案的方法开始于在其表面上制备具有纳米结构的模具。 将模具压在涂有树脂膜的基板或板上。 检测在涂覆有树脂膜的板的后表面上形成的对准标记的位置。 因此，执行模具和涂覆有树脂膜的板之间的相对对准。
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10.发明授权公开(公告)号：US07144298B2
公开(公告)日：2006-12-05
申请号：US11133300
申请日：2005-05-20
申请人： Souichi Katagiri , Ui Yamaguchi
发明人： Souichi Katagiri , Ui Yamaguchi
IPC分类号： B24B49/00
CPC分类号： B23H5/08 , B24B37/04 , C25F3/14 , C25F7/00 , H01L21/32125 , H01L21/7684
摘要： The object of the invention is to provide a method of manufacturing a semiconductor device and a processing apparatus for planarization wherein to form copper wiring in multiple layers. The removal of a residue of polishing by local electro polishing, the enhancement of the performance of planarization by using a grindstone and the reduction by small frictional force in electro polishing of damage, are enabled. To achieve the object, the following measures are taken. A residue of polishing of copper is removed by combining the detection of a local area including the residue of polishing of copper and local processing for electro polishing. As small-load processing for planarization is enabled by using electro polishing, multilayer interconnection structure using low-k material as a dielectric interlayer is also enabled. Plural pairs of small unit electrodes in a pair of which minus electrodes surround a plus electrode are provided to a tool for electro polishing, each electrode is connected to a power supply, pulse voltage is applied to each electrode and copper is electrolytically polished.
摘要翻译： 本发明的目的是提供一种制造半导体器件的方法和用于平坦化的处理装置，其中以多层形成铜布线。 通过局部电抛光去除抛光残留物，通过使用磨石提高平面化性能以及通过小摩擦力在电抛光中减少损伤。 为达到此目的，采取以下措施。 通过组合检测包括铜的抛光残余物和局部电抛光的局部区域来去除铜的抛光残余物。 通过使用电抛光能够实现平面化的小负载处理，也可以使用低k材料作为电介质中间层的多层互连结构。 将一对负电极围绕正电极的多对小单元电极提供给用于电抛光的工具，每个电极连接到电源，脉冲电压施加到每个电极并且铜被电解抛光。
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