发明申请
- 专利标题： Lithographic apparatus, device manufacturing method and exchangeable optical element
- 专利标题（中）： 光刻设备，器件制造方法和可交换光学元件
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申请号： US11341894申请日： 2006-01-30
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公开(公告)号： US20070177122A1公开(公告)日： 2007-08-02
- 发明人: Erik Loopstra , Adrianus Engelen , Bernardus Luttikhuis , Maria Rubingh , Johannes Hazenberg , Laurentius Jorritsma , Johannes Klerk , Bernhard Geuppert , Aart Van Beuzekom , Petrus Franciscus Mandigers , Franz Sorg , Peter Deufel
- 申请人： Erik Loopstra , Adrianus Engelen , Bernardus Luttikhuis , Maria Rubingh , Johannes Hazenberg , Laurentius Jorritsma , Johannes Klerk , Bernhard Geuppert , Aart Van Beuzekom , Petrus Franciscus Mandigers , Franz Sorg , Peter Deufel
- 申请人地址： NL Veldhoven DE Oberkochen
- 专利权人： ASML NETHERLANDS B.V.,CARL ZEISS SMT AG
- 当前专利权人： ASML NETHERLANDS B.V.,CARL ZEISS SMT AG
- 当前专利权人地址： NL Veldhoven DE Oberkochen
- 主分类号： G03B27/54
- IPC分类号： G03B27/54
摘要：
A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.
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