发明申请
US20070186856A1 PLASMA PROCESSING APPARATUS HAVING HIGH FREQUENCY POWER SOURCE WITH SAG COMPENSATION FUNCTION AND PLASMA PROCESSING METHOD
审中-公开
具有SAG补偿功能和等离子体处理方法的高频电源的等离子体处理装置
- 专利标题： PLASMA PROCESSING APPARATUS HAVING HIGH FREQUENCY POWER SOURCE WITH SAG COMPENSATION FUNCTION AND PLASMA PROCESSING METHOD
- 专利标题（中）： 具有SAG补偿功能和等离子体处理方法的高频电源的等离子体处理装置
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申请号： US11735574申请日： 2007-04-16
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公开(公告)号： US20070186856A1公开(公告)日： 2007-08-16
- 发明人: NAOKI YASUI , Seiichi Watanabe , Masahiro Sumiya , Hitoshi Tamura
- 申请人： NAOKI YASUI , Seiichi Watanabe , Masahiro Sumiya , Hitoshi Tamura
- 优先权： JP2003-357828 20031017
- 主分类号： C23C16/00
- IPC分类号： C23C16/00 ; C23F1/00
摘要：
The plasma processing apparatus wherein the means for applying a high frequency voltage, which becomes a voltage waveform in which a positive constant voltage and a negative constant voltage alternate with each other at given cycles, is constituted by a DC power source and a switching circuit (a chopper circuit).
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