发明申请
- 专利标题： Top coat for lithography processes
- 专利标题（中）： 平版印刷工艺的外套
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申请号： US11706243申请日： 2007-02-15
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公开(公告)号： US20070196773A1公开(公告)日： 2007-08-23
- 发明人: Scott Weigel , Peng Zang , Thomas Braymer , Gene Parris
- 申请人： Scott Weigel , Peng Zang , Thomas Braymer , Gene Parris
- 主分类号： G03C1/00
- IPC分类号： G03C1/00
摘要：
The present invention provides a top coat composition comprising a silicon-containing polymer prepared by hydrolysis and condensation of at least one silica source; a solvent; optionally a catalyst; and optionally water, wherein the silicon-containing polymer depolymerizes upon exposure to an aqueous base-containing solution.
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