发明申请
US20070202436A1 Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns 有权
用于形成活性图案的光敏组合物,形成这种活性图案的方法和结合这种活性图案的有机记忆装置

  • 专利标题: Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns
  • 专利标题(中): 用于形成活性图案的光敏组合物,形成这种活性图案的方法和结合这种活性图案的有机记忆装置
  • 申请号: US11655171
    申请日: 2007-01-19
  • 公开(公告)号: US20070202436A1
    公开(公告)日: 2007-08-30
  • 发明人: Sang LeeWon JooKwang LeeTae ChoiMyung Jung
  • 申请人: Sang LeeWon JooKwang LeeTae ChoiMyung Jung
  • 优先权: KR10-2006-0005828 20060119; KR10-2007-0005362 20070117
  • 主分类号: G03C1/00
  • IPC分类号: G03C1/00
Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns
摘要:
Disclosed herein are compositions useful in forming organic active patterns that may, in turn, be incorporated in organic memory devices. The compositions comprise N-containing conjugated electroconductive polymer(s), photoacid generator(s) and organic solvent(s) capable of dissolving suitable quantifies of both the electroconductive polymer and the photoacid generator. Also disclosed are methods for patterning organic active layers formed using one or more of the compositions to produce organic active patterns, portions of which may be arranged between opposed electrodes to provide organic memory cells. The methods include directly exposing and developing the organic active layer to obtain fine patterns without the use of a separate masking pattern, for example, a photoresist pattern, thereby tending to simplify the fabrication process and reduce the associated costs.
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