发明申请
US20070205407A1 Nitride semiconductor device and method for fabricating the same 有权
氮化物半导体器件及其制造方法

Nitride semiconductor device and method for fabricating the same
摘要:
A nitride semiconductor device includes a semiconductor stacked structure which is formed of a nitride semiconductor having a first principal surface and a second principal surface opposed to the first principal surface and which includes an active layer. The first principal surface of the semiconductor stacked structure is formed with a plurality of indentations whose plane orientations are the {0001} plane, and the plane orientation of the second principal surface is the {1-101} plane. The active layer is formed along the {1-101} plane.
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