发明申请
- 专利标题: Nitride semiconductor device and method for fabricating the same
- 专利标题(中): 氮化物半导体器件及其制造方法
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申请号: US11712482申请日: 2007-03-01
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公开(公告)号: US20070205407A1公开(公告)日: 2007-09-06
- 发明人: Hisayoshi Matsuo , Tatsuo Morita , Tetsuzo Ueda , Daisuke Ueda
- 申请人: Hisayoshi Matsuo , Tatsuo Morita , Tetsuzo Ueda , Daisuke Ueda
- 优先权: JP2006-058111 20060303
- 主分类号: H01L29/06
- IPC分类号: H01L29/06
摘要:
A nitride semiconductor device includes a semiconductor stacked structure which is formed of a nitride semiconductor having a first principal surface and a second principal surface opposed to the first principal surface and which includes an active layer. The first principal surface of the semiconductor stacked structure is formed with a plurality of indentations whose plane orientations are the {0001} plane, and the plane orientation of the second principal surface is the {1-101} plane. The active layer is formed along the {1-101} plane.
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