Invention Application
- Patent Title: Cleaning of photolithography masks
- Patent Title (中): 清洁光刻掩模
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Application No.: US11715125Application Date: 2007-03-07
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Publication No.: US20070209682A1Publication Date: 2007-09-13
- Inventor: Christophe Martin
- Applicant: Christophe Martin
- Applicant Address: FR Montrouge
- Assignee: STMicroelectronics S.A.
- Current Assignee: STMicroelectronics S.A.
- Current Assignee Address: FR Montrouge
- Priority: FRFR06/50805 20060308
- Main IPC: B08B7/04
- IPC: B08B7/04 ; B08B7/00 ; B08B3/00
Abstract:
A method and an equipment for cleaning masks used for photolithography steps, including at least one step of thermal treatment under pumping at a pressure lower than the atmospheric pressure and at a temperature greater than the ambient temperature.
Public/Granted literature
- US07927969B2 Cleaning of photolithography masks Public/Granted day:2011-04-19
Information query
IPC分类:
