Invention Application
- Patent Title: Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting
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Application No.: US11797713Application Date: 2007-05-07
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Publication No.: US20070212980A1Publication Date: 2007-09-13
- Inventor: Young-Sam Lim , Dong-Jun Lee , Nam-Soo Kim , Sung-Taek Moon , Kyoung-Moon Kang , Jae-Hyun So
- Applicant: Young-Sam Lim , Dong-Jun Lee , Nam-Soo Kim , Sung-Taek Moon , Kyoung-Moon Kang , Jae-Hyun So
- Priority: KR2003-38740 20030616
- Main IPC: B24B49/00
- IPC: B24B49/00 ; B24B7/30 ; B24B29/00 ; B24D11/00
Abstract:
A polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting using a pseudo window area, where the pseudo window area has a thickness less than a thickness of a polishing layer and a thickness greater than zero.
Public/Granted literature
- US07442111B2 Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting Public/Granted day:2008-10-28
Information query
