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1.发明授权Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting 失效抛光垫，压板，监测方法，制造方法和检测方法公开(公告)号：US07442111B2
公开(公告)日：2008-10-28
申请号：US11797713
申请日：2007-05-07
申请人： Young-Sam Lim , Dong-Jun Lee , Nam-Soo Kim , Sung-Taek Moon , Kyoung-Moon Kang , Jae-Hyun So
发明人： Young-Sam Lim , Dong-Jun Lee , Nam-Soo Kim , Sung-Taek Moon , Kyoung-Moon Kang , Jae-Hyun So
IPC分类号： B24B19/00
CPC分类号： B24B37/205 , B24B37/013
摘要： A polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting using a pseudo window area, where the pseudo window area has a thickness less than a thickness of a polishing layer and a thickness greater than zero.
摘要翻译： 抛光垫，压板，监控方法，制造方法以及使用伪窗口区域进行检测的方法，其中伪窗口区域的厚度小于抛光层的厚度，厚度大于零。
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2.发明授权Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting 失效抛光垫，压板，监测方法，制造方法和检测方法公开(公告)号：US07229337B2
公开(公告)日：2007-06-12
申请号：US10726637
申请日：2003-12-04
申请人： Young-Sam Lim , Dong-Jun Lee , Nam-Soo Kim , Sung-Taek Moon , Kyoung-Moon Kang , Jae-Hyun So
发明人： Young-Sam Lim , Dong-Jun Lee , Nam-Soo Kim , Sung-Taek Moon , Kyoung-Moon Kang , Jae-Hyun So
IPC分类号： B24B19/00
CPC分类号： B24B37/205 , B24B37/013
摘要： A polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting using a pseudo window area, where the pseudo window area has a thickness less than a thickness of a polishing layer and a thickness greater than zero.
摘要翻译： 抛光垫，压板，监控方法，制造方法以及使用伪窗口区域进行检测的方法，其中伪窗口区域的厚度小于抛光层的厚度，厚度大于零。
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3.发明授权Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting 失效抛光垫，压板，监测方法，制造方法和检测方法公开(公告)号：US07662022B2
公开(公告)日：2010-02-16
申请号：US12232521
申请日：2008-09-18
申请人： Young-Sam Lim , Dong-Jun Lee , Nam-Soo Kim , Sung-Taek Moon , Kyoung-Moon Kang , Jae-Hyun So
发明人： Young-Sam Lim , Dong-Jun Lee , Nam-Soo Kim , Sung-Taek Moon , Kyoung-Moon Kang , Jae-Hyun So
IPC分类号： B24B19/00
CPC分类号： B24B37/205 , B24B37/013
摘要： A polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting using a pseudo window area, where the pseudo window area has a thickness less than a thickness of a polishing layer and a thickness greater than zero.
摘要翻译： 抛光垫，压板，监测方法，制造方法以及使用伪窗口区域进行检测的方法，其中伪窗口区域的厚度小于抛光层的厚度，厚度大于零。
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4.发明申请公开(公告)号：US20070212980A1
公开(公告)日：2007-09-13
申请号：US11797713
申请日：2007-05-07
申请人： Young-Sam Lim , Dong-Jun Lee , Nam-Soo Kim , Sung-Taek Moon , Kyoung-Moon Kang , Jae-Hyun So
发明人： Young-Sam Lim , Dong-Jun Lee , Nam-Soo Kim , Sung-Taek Moon , Kyoung-Moon Kang , Jae-Hyun So
CPC分类号： B24B37/205 , B24B37/013
摘要： A polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting using a pseudo window area, where the pseudo window area has a thickness less than a thickness of a polishing layer and a thickness greater than zero.
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5.发明申请Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting 失效抛光垫，压板，监测方法，制造方法和检测方法公开(公告)号：US20090029630A1
公开(公告)日：2009-01-29
申请号：US12232521
申请日：2008-09-18
申请人： Young-Sam Lim , Dong-Jun Lee , Nam-Soo Kim , Sung-Taek Moon , Kyoung-Moon Kang , Jae-Hyun So
发明人： Young-Sam Lim , Dong-Jun Lee , Nam-Soo Kim , Sung-Taek Moon , Kyoung-Moon Kang , Jae-Hyun So
CPC分类号： B24B37/205 , B24B37/013
摘要： A polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting using a pseudo window area, where the pseudo window area has a thickness less than a thickness of a polishing layer and a thickness greater than zero.
摘要翻译： 抛光垫，压板，监测方法，制造方法以及使用伪窗口区域进行检测的方法，其中伪窗口区域的厚度小于抛光层的厚度，厚度大于零。
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6.发明申请Slurry compositions, methods of preparing slurry compositions, and methods of polishing an object using slurry compositions 失效浆料组合物，制备浆料组合物的方法，以及使用浆料组合物抛光物体的方法公开(公告)号：US20060060568A1
公开(公告)日：2006-03-23
申请号：US11205029
申请日：2005-08-17
申请人： Jae-Hyun So , Sung-Taek Moon , Dong-Jun Lee , Nam-Soo Kim , Bong-Su Ahn , Kyoung-Moon Kang
发明人： Jae-Hyun So , Sung-Taek Moon , Dong-Jun Lee , Nam-Soo Kim , Bong-Su Ahn , Kyoung-Moon Kang
IPC分类号： C09K13/00 , C03C15/00 , B44C1/22 , H01L21/461
CPC分类号： H01L21/7684 , C09G1/02 , C09K3/1463 , H01L21/3212
摘要： A slurry composition includes an acidic aqueous solution and one or both of, an amphoteric surfactant and a glycol compound. Examples of the amphoteric surfactant include a betaine compound and an amino acid compound, and examples of the amino acid compound include lysine, proline and arginine. Examples of the glycol compound include diethylene glycol, ethylene glycol and polyethylene glycol.
摘要翻译： 浆料组合物包括酸性水溶液和两性表面活性剂和二醇化合物中的一种或两种。 两性表面活性剂的实例包括甜菜碱化合物和氨基酸化合物，氨基酸化合物的实例包括赖氨酸，脯氨酸和精氨酸。 二醇化合物的实例包括二甘醇，乙二醇和聚乙二醇。
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7.发明授权Slurry compositions, methods of preparing slurry compositions, and methods of polishing an object using slurry compositions 有权浆料组合物，制备浆料组合物的方法，以及使用浆料组合物抛光物体的方法公开(公告)号：US08007676B2
公开(公告)日：2011-08-30
申请号：US12128675
申请日：2008-05-29
申请人： Jae-Hyun So , Sung-Taek Moon , Dong-Jun Lee , Nam-Soo Kim , Bong-Su Ahn , Kyoung-Moon Kang
发明人： Jae-Hyun So , Sung-Taek Moon , Dong-Jun Lee , Nam-Soo Kim , Bong-Su Ahn , Kyoung-Moon Kang
IPC分类号： C03C15/00
CPC分类号： H01L21/7684 , C09G1/02 , C09K3/1463 , H01L21/3212
摘要： A slurry composition includes an acidic aqueous solution and one or both of, an amphoteric surfactant and a glycol compound. Examples of the amphoteric surfactant include a betaine compound and an amino acid compound, and examples of the amino acid compound include lysine, proline and arginine. Examples of the glycol compound include diethylene glycol, ethylene glycol and polyethylene glycol.
摘要翻译： 浆料组合物包括酸性水溶液和两性表面活性剂和二醇化合物中的一种或两种。 两性表面活性剂的实例包括甜菜碱化合物和氨基酸化合物，氨基酸化合物的实例包括赖氨酸，脯氨酸和精氨酸。 二醇化合物的实例包括二甘醇，乙二醇和聚乙二醇。
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8.发明授权Slurry compositions, methods of preparing slurry compositions, and methods of polishing an object using slurry compositions 失效浆料组合物，制备浆料组合物的方法，以及使用浆料组合物抛光物体的方法公开(公告)号：US07402261B2
公开(公告)日：2008-07-22
申请号：US11205029
申请日：2005-08-17
申请人： Jae-Hyun So , Sung-Taek Moon , Dong-Jun Lee , Nam-Soo Kim , Bong-Su Ahn , Kyoung-Moon Kang
发明人： Jae-Hyun So , Sung-Taek Moon , Dong-Jun Lee , Nam-Soo Kim , Bong-Su Ahn , Kyoung-Moon Kang
IPC分类号： C09K13/00
CPC分类号： H01L21/7684 , C09G1/02 , C09K3/1463 , H01L21/3212
摘要： A slurry composition includes an acidic aqueous solution and one or both of, an amphoteric surfactant and a glycol compound. Examples of the amphoteric surfactant include a betaine compound and an amino acid compound, and examples of the amino acid compound include lysine, proline and arginine. Examples of the glycol compound include diethylene glycol, ethylene glycol and polyethylene glycol.
摘要翻译： 浆料组合物包括酸性水溶液和两性表面活性剂和二醇化合物中的一种或两种。 两性表面活性剂的实例包括甜菜碱化合物和氨基酸化合物，氨基酸化合物的实例包括赖氨酸，脯氨酸和精氨酸。 二醇化合物的实例包括二甘醇，乙二醇和聚乙二醇。
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9.发明授权Additive composition, slurry composition including the same, and method of polishing an object using the slurry composition 有权添加剂组合物，包含其的浆料组合物以及使用该浆料组合物抛光物体的方法公开(公告)号：US07858527B2
公开(公告)日：2010-12-28
申请号：US11861490
申请日：2007-09-26
申请人： Nam-Soo Kim , Sang-Mun Chon , Young-Sam Lim , Kyoung-Moon Kang , Sei-Cheol Lee , Jae-Hyun So , Dong-Jun Lee
发明人： Nam-Soo Kim , Sang-Mun Chon , Young-Sam Lim , Kyoung-Moon Kang , Sei-Cheol Lee , Jae-Hyun So , Dong-Jun Lee
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： H01L21/31053 , C08L101/02 , C09G1/02
摘要： An additive composition for a slurry contains a first salt of polymeric acid including a first polymeric acid having a first weight average molecular weight and a first base material, and a second salt of polymeric acid including a second polymeric acid having a second weight average molecular weight and a second base material. A slurry composition is prepared by mixing the additive composition, a polishing particle composition, and water. When implementing a chemical mechanical polishing using the slurry composition, a favorable polishing selectivity is realized.
摘要翻译： 用于浆料的添加剂组合物包含聚合酸的第一盐，其包含具有第一重均分子量和第一基础材料的第一聚合酸和包含第二聚合酸的第二盐，所述第二聚合酸具有第二重均分子量 和第二基材。 通过混合添加剂组合物，抛光颗粒组合物和水来制备浆料组合物。 当使用浆料组合物进行化学机械抛光时，实现了良好的抛光选择性。
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10.发明授权Additive composition, slurry composition including the same, and method of polishing an object using the slurry composition 有权添加剂组合物，包含其的浆料组合物以及使用该浆料组合物抛光物体的方法公开(公告)号：US07288212B2
公开(公告)日：2007-10-30
申请号：US10293918
申请日：2002-11-14
申请人： Nam-Soo Kim , Sang-Mun Chon , Young-Sam Lim , Kyoung-Moon Kang , Sei-Cheol Lee , Jae-Hyun So , Dong-Jun Lee
发明人： Nam-Soo Kim , Sang-Mun Chon , Young-Sam Lim , Kyoung-Moon Kang , Sei-Cheol Lee , Jae-Hyun So , Dong-Jun Lee
IPC分类号： C09K13/00 , C09K13/04 , H01L21/302
CPC分类号： H01L21/31053 , C08L101/02 , C09G1/02
摘要： An additive composition for a slurry contains a first salt of polymeric acid including a first polymeric acid having a first weight average molecular weight and a first base material, and a second salt of polymeric acid including a second polymeric acid having a second weight average molecular weight and a second base material. A slurry composition is prepared by mixing the additive composition, a polishing particle composition, and water. When implementing a chemical mechanical polishing using the slurry composition, a favorable polishing selectivity is realized.
摘要翻译： 用于浆料的添加剂组合物包含聚合酸的第一盐，其包含具有第一重均分子量和第一基础材料的第一聚合酸和包含第二聚合酸的第二盐，所述第二聚合酸具有第二重均分子量 和第二基材。 通过混合添加剂组合物，抛光颗粒组合物和水来制备浆料组合物。 当使用浆料组合物进行化学机械抛光时，实现了良好的抛光选择性。
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