Invention Application
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US11377636Application Date: 2006-03-17
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Publication No.: US20070216881A1Publication Date: 2007-09-20
- Inventor: Harmen Van Der Schoot , Erik Loopstra , Fransicus Jacobs , Godfried Franciscus Geelen
- Applicant: Harmen Van Der Schoot , Erik Loopstra , Fransicus Jacobs , Godfried Franciscus Geelen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03B27/42
- IPC: G03B27/42

Abstract:
A moveable member is provided which extends the top surface of a substrate table, in plan, beyond a bumper which protects the substrate table during collision. The moveable member may be retracted to a retracted position in which it no longer extends beyond the bumper. In this way it is possible to move two substrate tables together and to allow the retractable member to pass under a liquid supply system which normally provides liquid between the projection system and a substrate without turning off of the liquid supply system.
Public/Granted literature
- US07310132B2 Lithographic apparatus and device manufacturing method Public/Granted day:2007-12-18
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