发明申请
- 专利标题： Cavity ring-down spectrometer for semiconductor processing
- 专利标题（中）： 用于半导体加工的腔下降光谱仪
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申请号： US11384017申请日： 2006-03-17
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公开(公告)号： US20070216903A1公开(公告)日： 2007-09-20
- 发明人: Barrett Cole , Yuandong Gu
- 申请人： Barrett Cole , Yuandong Gu
- 主分类号： G01N21/61
- IPC分类号： G01N21/61
摘要：
An apparatus is provided for measuring a gas within a semiconductor thin film process. The apparatus includes an optical resonator disposed within an environment of the thin-film process, a tunable laser that excites the optical resonator at a characteristic frequency of the gas and a detector that detects an energy within the resonator.
公开/授权文献
- US07369242B2 Cavity ring-down spectrometer for semiconductor processing 公开/授权日：2008-05-06
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