A workstation comprises a substrate, a cleaning apparatus used for cleaning a mask, and a controller for controlling the cleaning apparatus. The cleaning apparatus comprises a housing having dust-free surroundings, a holder, a cleaner and a blower. The holder, the cleaner and the blower are disposed in the housing. The mask comprises a glass plate with particles adhered thereto and a pellicle. The holder encloses the pellicle and exposes the glass plate with the particles adhered thereto. The cleaner comprises an acting portion used for removing the particle from the glass plate of the substrate. The blower blows a gas to dry the glass plate of the substrate when the particle is removed by the acting portion of the cleaner.