公开(公告)号：US08142959B2

公开(公告)日：2012-03-27

申请号：US12205168

申请日：2008-09-05

Applicant: Chih-Wing Chang

Inventor： Chih-Wing Chang

IPC: G03F1/00

CPC classification number: G03F1/84 ,  G03F1/44 ,  G03F1/82

Abstract: A photomask is provided that includes a transparent substrate, a mask pattern formed on a first area of the substrate, the mask pattern having one or more openings that allow light radiation to pass through and having one or more features formed of a first material, and an inspection structure formed on a second area of the substrate different from the first area, the inspection structure being formed of a second material different from the first material.

Abstract translation: 提供一种光掩模，其包括透明基板，形成在基板的第一区域上的掩模图案，所述掩模图案具有允许光辐射通过并具有由第一材料形成的一个或多个特征的一个或多个开口，以及 所述检查结构形成在所述基板的与所述第一区域不同的第二区域上，所述检查结构由不同于所述第一材料的第二材料形成。

公开(公告)号：US20100062348A1

公开(公告)日：2010-03-11

申请号：US12205168

申请日：2008-09-05

Applicant: Chih-Wing Chang

Inventor： Chih-Wing Chang

IPC: G03F1/00

CPC classification number: G03F1/84 ,  G03F1/44 ,  G03F1/82

Abstract: A photomask is provided that includes a transparent substrate, a mask pattern formed on a first area of the substrate, the mask pattern having one or more openings that allow light radiation to pass through and having one or more features formed of a first material, and an inspection structure formed on a second area of the substrate different from the first area, the inspection structure being formed of a second material different from the first material.

Abstract translation: 提供一种光掩模，其包括透明基板，形成在基板的第一区域上的掩模图案，所述掩模图案具有允许光辐射通过并具有由第一材料形成的一个或多个特征的一个或多个开口，以及 所述检查结构形成在所述基板的与所述第一区域不同的第二区域上，所述检查结构由不同于所述第一材料的第二材料形成。

公开(公告)号：US20080233488A1

公开(公告)日：2008-09-25

申请号：US11717127

申请日：2007-03-13

Applicant: Chih-Wing Chang

Inventor： Chih-Wing Chang

IPC: G03F1/00

CPC classification number: G03F1/48 ,  Y10S148/106 ,  Y10S438/945

Abstract: A mask with hydrophobic surface. The mask includes a substrate, a plurality of patterns formed on the substrate, and a self-assembled monolayer (SAM) formed on the substrate exposed by the patterns. The self-assembled monolayer includes an alkyltrichlorosilane-based layer such as octadecyltrichlorosilane (OTS) or perfluorodecyltrichlorosilane (FDTS) and formed by vapor process or solution process.

Abstract translation: 具有疏水表面的面具。 掩模包括基板，形成在基板上的多个图案，以及在由图案曝光的基板上形成的自组装单层（SAM）。 自组装单层包括烷基三氯硅烷基层，如十八烷基三氯硅烷（OTS）或全氟癸基三氯硅烷（FDTS），并通过蒸气法或溶液法形成。

公开(公告)号：US08925290B2

公开(公告)日：2015-01-06

申请号：US13228175

申请日：2011-09-08

Applicant: Yung-Chih Chang ,  Chih-Wing Chang

Inventor： Yung-Chih Chang ,  Chih-Wing Chang

IPC: B65B55/00 ,  H01L23/02 ,  B63C11/00 ,  B65B61/20

CPC classification number: B65D81/264 ,  B63C11/00 ,  B65B31/024 ,  B65B55/00 ,  B65B61/20 ,  B65D43/02 ,  B65D55/02 ,  B65D85/70 ,  H01L23/02 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A mask storage device and a method of preventing defect formation on a mask are provided. The method includes providing a mask storage device comprising a first and second shell configured to form a sealed space in a closed state and a desiccant positioned within the mask storage device. The method further includes placing a mask inside the mask storage device and sealing the mask storage device with the mask and desiccant inside the sealed space.

Abstract translation: 提供掩模存储装置和防止掩模上的缺陷形成的方法。 该方法包括提供掩模存储装置，该掩模存储装置包括构造成在封闭状态下形成密封空间的第一和第二壳体以及位于掩模存储装置内的干燥剂。 该方法还包括将掩模放置在掩模存储装置内并将掩模存储装置与密封空间内的面罩和干燥剂密封。

公开(公告)号：US20080060974A1

公开(公告)日：2008-03-13

申请号：US11358306

申请日：2006-02-21

Applicant: S. Y. Liang ,  Chih-Wing Chang ,  Hsin-Yuan Chen ,  Chung-Jen Chen ,  J. F. Lee ,  Chih-Chien Wang ,  Chun-Yi Ho

Inventor： S. Y. Liang ,  Chih-Wing Chang ,  Hsin-Yuan Chen ,  Chung-Jen Chen ,  J. F. Lee ,  Chih-Chien Wang ,  Chun-Yi Ho

IPC: B65D85/00

CPC classification number: G03F7/70741 ,  G03F1/66

Abstract: A reticle carrier including a base portion and a cover portion at least partially detachable from the base portion. The base portion and the cover portion are configured to collectively house a reticle in a region collectively defined by the base portion and the cover portion when the base portion and the cover portion are fully attached. At least a portion of an interior surface of at least one of the base portion and the cover portion is treated with a sulfide-absorbing composition, such as silver or a silver-containing alloy.

Abstract translation: 一种标线载体，其包括基部和至少部分地可从基部分离的盖部。 底座部分和盖部分构造成当底座部分和盖部分完全安装时，共同地将掩模版容纳在由基部和盖部共同限定的区域中。 基体部分和盖部分中的至少一个的内表面的至少一部分用硫化物吸收组合物如银或含银合金进行处理。

公开(公告)号：US20070227565A1

公开(公告)日：2007-10-04

申请号：US11391236

申请日：2006-03-29

Applicant: Chih-Wing Chang ,  Chun-Yi Ho ,  S. Liang ,  Chung-Jen Chen

Inventor： Chih-Wing Chang ,  Chun-Yi Ho ,  S. Liang ,  Chung-Jen Chen

IPC: B08B3/00

CPC classification number: H01L21/67028

Abstract: A workstation comprises a substrate, a cleaning apparatus used for cleaning a mask, and a controller for controlling the cleaning apparatus. The cleaning apparatus comprises a housing having dust-free surroundings, a holder, a cleaner and a blower. The holder, the cleaner and the blower are disposed in the housing. The mask comprises a glass plate with particles adhered thereto and a pellicle. The holder encloses the pellicle and exposes the glass plate with the particles adhered thereto. The cleaner comprises an acting portion used for removing the particle from the glass plate of the substrate. The blower blows a gas to dry the glass plate of the substrate when the particle is removed by the acting portion of the cleaner.

Abstract translation: 工作站包括基板，用于清洁掩模的清洁装置和用于控制清洁装置的控制器。 清洁装置包括具有无尘环境的壳体，保持器，清洁器和鼓风机。 保持器，清洁器和鼓风机设置在壳体中。 掩模包括具有粘附到其上的颗粒的玻璃板和防护薄膜。 保持器围绕防护薄膜组件并暴露玻璃板，附着有颗粒。 清洁器包括用于从基板的玻璃板去除颗粒的作用部分。 当通过清洁器的作用部分去除颗粒时，鼓风机吹扫气体以干燥基板的玻璃板。

公开(公告)号：US07635652B2

公开(公告)日：2009-12-22

申请号：US11717127

申请日：2007-03-13

Applicant: Chih-Wing Chang

Inventor： Chih-Wing Chang

IPC: H01L21/31

CPC classification number: G03F1/48 ,  Y10S148/106 ,  Y10S438/945

Abstract: A mask with hydrophobic surface. The mask includes a substrate, a plurality of patterns formed on the substrate, and a self-assembled monolayer (SAM) formed on the substrate exposed by the patterns. The self-assembled monolayer includes an alkyltrichlorosilane-based layer such as octadecyltrichlorosilane (OTS) or perfluorodecyltrichlorosilane (FDTS) and formed by vapor process or solution process.

Abstract translation: 具有疏水表面的面具。 掩模包括基板，形成在基板上的多个图案，以及在由图案曝光的基板上形成的自组装单层（SAM）。 自组装单层包括烷基三氯硅烷基层，如十八烷基三氯硅烷（OTS）或全氟癸基三氯硅烷（FDTS），并通过蒸气法或溶液法形成。

公开(公告)号：US06727029B1

公开(公告)日：2004-04-27

申请号：US10336550

申请日：2003-01-02

Applicant: Cheng-Ming Wu ,  Paul Chu ,  Chiou-Sung Chiu ,  Chih-Wing Chang

Inventor： Cheng-Ming Wu ,  Paul Chu ,  Chiou-Sung Chiu ,  Chih-Wing Chang

IPC: G03F900

CPC classification number: G03F1/64

Abstract: A reticle for holding a mask thereon with reduced particle contamination problem is described. The reticle is constructed by a base plate that is formed of an optically transparent material such as quartz and has a recessed slot in a top surface to enclose an area at least the size of a mask formed on the base plate. An adhesive partially fills the recessed slot such that a top surface of the adhesive is at least 0.5 mm below the top surface of the base plate. A pellicle frame is mounted in the recessed slot with a bottom end of the frame encased in the adhesive and a thin film covering the top end of the pellicle frame to from a hermetically sealed cavity for protecting the mask.

Abstract translation: 描述了用于在其上保持减少的颗粒污染问题的掩模上的掩模版。 掩模版由基板构成，该基板由诸如石英的光学透明材料形成，并且在顶表面中具有凹槽，以至少包围形成在基板上的掩模的尺寸的区域。 粘合剂部分地填充凹槽，使得粘合剂的顶表面在基板的顶表面下方至少0.5mm。 防护薄膜组件框架安装在凹槽中，框架的底端封装在粘合剂中，并且薄膜覆盖防护薄膜组件框架的顶端，以从密封的腔体中保护面罩。

公开(公告)号：US20130062243A1

公开(公告)日：2013-03-14

申请号：US13228175

申请日：2011-09-08

Applicant: Yung-Chih CHANG ,  Chih-Wing CHANG

Inventor： Yung-Chih CHANG ,  Chih-Wing CHANG

IPC: B65D85/00 ,  B65B5/04

CPC classification number: B65D81/264 ,  B63C11/00 ,  B65B31/024 ,  B65B55/00 ,  B65B61/20 ,  B65D43/02 ,  B65D55/02 ,  B65D85/70 ,  H01L23/02 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A mask storage device and a method of preventing defect formation on a mask are provided. The method includes providing a mask storage device comprising a first and second shell configured to form a sealed space in a closed state and a desiccant positioned within the mask storage device. The method further includes placing a mask inside the mask storage device and sealing the mask storage device with the mask and desiccant inside the sealed space.

Abstract translation: 提供掩模存储装置和防止掩模上的缺陷形成的方法。 该方法包括提供掩模存储装置，该掩模存储装置包括构造成在封闭状态下形成密封空间的第一和第二壳体以及位于掩模存储装置内的干燥剂。 该方法还包括将掩模放置在掩模存储装置内并将掩模存储装置与密封空间内的面罩和干燥剂密封。