发明申请
US20070229942A1 METHOD OF PRODUCING MOLD HAVING UNEVEN STRUCTURE, MOLD FOR OPTICAL ELEMENT, AND OPTICAL ELEMENT
有权
生产具有未来结构的模具的方法,光学元件和光学元件的模具
- 专利标题: METHOD OF PRODUCING MOLD HAVING UNEVEN STRUCTURE, MOLD FOR OPTICAL ELEMENT, AND OPTICAL ELEMENT
- 专利标题(中): 生产具有未来结构的模具的方法,光学元件和光学元件的模具
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申请号: US11686512申请日: 2007-03-15
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公开(公告)号: US20070229942A1公开(公告)日: 2007-10-04
- 发明人: Ryoko HORIE , Yasuhiro MATSUO , Nobuhiro YASUI , Toru Den
- 申请人: Ryoko HORIE , Yasuhiro MATSUO , Nobuhiro YASUI , Toru Den
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 优先权: JP2006-075617 20060317; JP2006-193248 20060713
- 主分类号: G06K7/10
- IPC分类号: G06K7/10
摘要:
A method of producing a mold having an uneven structure and a mold for an optical element are provided. The method includes forming on a nickel substrate a mixed film using nickel and a material which phase separates from nickel simultaneously, the mixed film including a plurality of cylinders including nickel as a component thereof and a matrix region including the material which phase separates from nickel as a component thereof and surrounding the plurality of cylinders; and removing the matrix portion from the mixed film by etching to give a mold including nickel or a nickel alloy. The uneven structure is disposed in plurality on the substrate, and a pitch of the uneven structure is within a range of 30 nm or more and 500 nm or less and a depth of the uneven structure is within a range of 100 nm or more.
公开/授权文献
- US08133538B2 Method of producing mold having uneven structure 公开/授权日:2012-03-13
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