发明申请
- 专利标题: Classification apparatus for semiconductor substrate, classification method of semiconductor substrate, and manufacturing method of semiconductor device
- 专利标题(中): 半导体衬底的分类装置,半导体衬底的分类方法以及半导体器件的制造方法
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申请号: US11584607申请日: 2006-10-23
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公开(公告)号: US20070231934A1公开(公告)日: 2007-10-04
- 发明人: Toshiya Sato , Katsuto Tanahashi
- 申请人: Toshiya Sato , Katsuto Tanahashi
- 申请人地址: JP Kawasaki
- 专利权人: FUJITSU LIMITED
- 当前专利权人: FUJITSU LIMITED
- 当前专利权人地址: JP Kawasaki
- 优先权: JP2006-089311 20060328
- 主分类号: H01L21/66
- IPC分类号: H01L21/66 ; H01L21/461 ; G01L21/30
摘要:
A classification apparatus for the semiconductor substrate is provided with a bow measuring section which accepts silicon substrates and measures respective bows thereof. The classification apparatus is also provided with a bow judging section which, based on one or more standard value(s) set in advance, checks a measurement result by the bow measuring section against the standard value(s). The bow judging section judges to which of ranges defined based on the standard value(s) of the bow the measurement result by the bow measuring section belongs. Further, the classification apparatus is provided with a sorting section which accepts the silicon substrate having been measured by the bow measuring section and sorts the accepted silicon substrates based on the judgment results by the bow judging section. In other words, silicon substrates are grouped according to the bows by the sorting section. Then, respective silicon substrates are discharged in a grouped state.
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