发明申请
- 专利标题: Semiconductor device and method for manufacturing the same
- 专利标题(中): 半导体装置及其制造方法
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申请号: US11729972申请日: 2007-03-30
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公开(公告)号: US20070235812A1公开(公告)日: 2007-10-11
- 发明人: Hideaki Fujiwara , Kazunori Fujita , Yoshikazu Yamaoka , Hideki Mizuhara , Yasunori Inoue
- 申请人: Hideaki Fujiwara , Kazunori Fujita , Yoshikazu Yamaoka , Hideki Mizuhara , Yasunori Inoue
- 优先权: JP2006-097066 20060331; JP2007-037169 20070216
- 主分类号: H01L23/62
- IPC分类号: H01L23/62
摘要:
A semiconductor device operating at low voltage is provided where a threshold voltage is controlled with ease. A semiconductor substrate is element-isolated by element isolation regions. A source region and a source region are spaced from each other on the semiconductor substrate. A gate electrode is formed between the source region and the drain by way of a gate insulator. A plurality of insulating particles are embedded in the gate electrode in a scattered manner at an interface between the gate insulator and the gate electrode, where the particles are in contact with the gate insulator.
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