发明申请
US20070235812A1 Semiconductor device and method for manufacturing the same 审中-公开
半导体装置及其制造方法

Semiconductor device and method for manufacturing the same
摘要:
A semiconductor device operating at low voltage is provided where a threshold voltage is controlled with ease. A semiconductor substrate is element-isolated by element isolation regions. A source region and a source region are spaced from each other on the semiconductor substrate. A gate electrode is formed between the source region and the drain by way of a gate insulator. A plurality of insulating particles are embedded in the gate electrode in a scattered manner at an interface between the gate insulator and the gate electrode, where the particles are in contact with the gate insulator.
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