发明申请
- 专利标题： Underlayer Coating Forming Composition for Lithography Containing Naphthalene Ring Having Halogen Atom
- 专利标题（中）： 含有卤素原子的萘环的平版印刷的底层涂层成型组合物
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申请号： US11630891申请日： 2005-06-24
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公开(公告)号： US20070238029A1公开(公告)日： 2007-10-11
- 发明人: Satoshi Takei , Takahiro Sakaguchi , Tomoyuki Enomoto
- 申请人： Satoshi Takei , Takahiro Sakaguchi , Tomoyuki Enomoto
- 申请人地址： JP Tokyo 101-0054
- 专利权人： NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人： NISSAN CHEMICAL INDUSTRIES, LTD.
- 当前专利权人地址： JP Tokyo 101-0054
- 优先权： JP2004-196955 20040702
- 国际申请： PCT/JP05/11645 WO 20050624
- 主分类号： C08F12/14
- IPC分类号： C08F12/14 ; H01L21/027
摘要：
There is provided an underlayer coating forming composition for lithography, and an underlayer coating having a high dry etching rate compared with photoresist, and causing no intermixing with the photoresist, which are used in lithography process of manufacture of semiconductor device. Concretely, it is an underlayer coating forming composition comprising a polymer having a structural unit containing naphthalene ring substituted with halogen atom in a molar ratio of 0.3 or more in the structural units constituting the polymer, a solvent.
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