发明申请
US20070238239A1 Rare earth element-doped oxide precursor with silicon nanocrystals
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具有硅纳米晶体的稀土元素掺杂氧化物前体
- 专利标题: Rare earth element-doped oxide precursor with silicon nanocrystals
- 专利标题(中): 具有硅纳米晶体的稀土元素掺杂氧化物前体
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申请号: US11224549申请日: 2005-09-12
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公开(公告)号: US20070238239A1公开(公告)日: 2007-10-11
- 发明人: Wei-Wei Zhuang , Yoshi Ono , Sheng Teng-Hsu , Tingkai Li
- 申请人: Wei-Wei Zhuang , Yoshi Ono , Sheng Teng-Hsu , Tingkai Li
- 主分类号: H01L21/8238
- IPC分类号: H01L21/8238
摘要:
A method is provided for forming a rare earth element-doped silicon oxide (SiO2) precursor with nanocrystalline (nc) Si particles. In one aspect the method comprises: mixing Si particles into a first organic solvent, forming a first solution with a first boiling point; filtering the first solution to remove large Si particles; mixing a second organic solvent having a second boiling point, higher than the first boiling point, to the filtered first solution; and, fractionally distilling, forming a second solution of nc Si particles. The Si particles are formed by immersing a Si wafer into a third solution including hydrofluoric (HF) acid and alcohol, applying an electric bias, and forming a porous Si layer overlying the Si wafer. Then, the Si particles are mixed into the organic solvent by depositing the Si wafer into the first organic solvent, and ultrasonically removing the porous Si layer from the Si wafer.
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