Invention Application
US20070246639A1 WAFER FOR MANUFACTURING IMAGE SENSORS, TEST KEY LAYOUT FOR DEFECTS INSPECTION, AND METHODS FOR MANUFACTURING IMAGE SENSORS AND FOR FORMING TEST KEY 有权
用于制造图像传感器的波形,用于缺陷检查的测试关键布局,以及用于制造图像传感器和形成测试键的方法

  • Patent Title: WAFER FOR MANUFACTURING IMAGE SENSORS, TEST KEY LAYOUT FOR DEFECTS INSPECTION, AND METHODS FOR MANUFACTURING IMAGE SENSORS AND FOR FORMING TEST KEY
  • Patent Title (中): 用于制造图像传感器的波形,用于缺陷检查的测试关键布局,以及用于制造图像传感器和形成测试键的方法
  • Application No.: US11379229
    Application Date: 2006-04-19
  • Publication No.: US20070246639A1
    Publication Date: 2007-10-25
  • Inventor: Cheng-Hung Yu
  • Applicant: Cheng-Hung Yu
  • Main IPC: H01L27/00
  • IPC: H01L27/00
WAFER FOR MANUFACTURING IMAGE SENSORS, TEST KEY LAYOUT FOR DEFECTS INSPECTION, AND METHODS FOR MANUFACTURING IMAGE SENSORS AND FOR FORMING TEST KEY
Abstract:
A wafer for manufacturing image sensors is disclosed. The wafer includes an image sensor and a test key. The image sensor includes a plurality of micro-lenses; the test key includes a plurality of micro-lens samples for defects inspection. The arrangement of the micro-lens samples on the test key is substantially different from the arrangement of the micro-lenses on the image sensor. The arrangement of the micro-lens samples on the test key allows defects inspection to become less complicated.
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