发明申请
US20070258134A1 Lithography Lens System And Projection Exposure System Provided With At Least One Lithography Lens System Of This Type
有权
光刻镜片系统和投影曝光系统提供了这种类型的至少一个平版镜片系统
- 专利标题: Lithography Lens System And Projection Exposure System Provided With At Least One Lithography Lens System Of This Type
- 专利标题(中): 光刻镜片系统和投影曝光系统提供了这种类型的至少一个平版镜片系统
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申请号: US10571267申请日: 2004-07-14
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公开(公告)号: US20070258134A1公开(公告)日: 2007-11-08
- 发明人: Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
- 申请人: Hans-Juergen Rostalski , Alexander Epple , Aurelian Dodoc , Johannes Wangler , Karl-Heinz Schuster , Joerg Schultz , Franz-Josef Stickel , Wolfgang Singer , Joachim Wietzorrek
- 优先权: DE10341986.1 20030909
- 国际申请: PCT/EP04/07753 WO 20040714
- 主分类号: G02B17/00
- IPC分类号: G02B17/00
摘要:
An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.
公开/授权文献
信息查询
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B17/00 | 有或无折射元件的具有反射面的系统 |