Invention Application
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
-
Application No.: US11433767Application Date: 2006-05-15
-
Publication No.: US20070263201A1Publication Date: 2007-11-15
- Inventor: Erik Loopstra , Joost Ottens
- Applicant: Erik Loopstra , Joost Ottens
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03B27/58
- IPC: G03B27/58

Abstract:
An article support constructed to support an article for lithographic processing purposes is disclosed. The article support includes a channel configuration arranged to guide thermally stabilizing media in the article support to provide thermal stabilization to the article, wherein the channel configuration comprises an input channel structure and an output channel structure, the input and output channel structures arranged in a nested configuration and connected to each other by a fine grid structure provided at or near a surface of the article support. A lithographic apparatus and device manufacturing incorporating the article support is also disclosed.
Public/Granted literature
- US07593096B2 Lithographic apparatus and device manufacturing method Public/Granted day:2009-09-22
Information query