发明申请
- 专利标题: Plasma treatment installation
- 专利标题(中): 等离子体处理装置
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申请号: US11798795申请日: 2007-05-17
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公开(公告)号: US20070267389A1公开(公告)日: 2007-11-22
- 发明人: Siegfried Straemke
- 申请人: Siegfried Straemke
- 优先权: DE202006007937.8 20060518
- 主分类号: B23K9/00
- IPC分类号: B23K9/00
摘要:
A plasma treatment installation comprising at least two stationary workpiece holders adapted for controlled rotation about their respective axis and having supporting plates for supporting workpieces for the treatment thereof, at least one hood to be set on a workpiece holder that is adapted to enclose each of a plurality of workpiece holders to form a sealed treatment space, and a manipulator for automatically equipping the supporting plates of a workpiece holder with workpieces, while the other workpiece holder is covered by the hood to perform the plasma treatment of the workpieces.
公开/授权文献
- US08969753B2 Plasma treatment installation 公开/授权日:2015-03-03
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