发明申请
US20070267389A1 Plasma treatment installation 有权
等离子体处理装置

  • 专利标题: Plasma treatment installation
  • 专利标题(中): 等离子体处理装置
  • 申请号: US11798795
    申请日: 2007-05-17
  • 公开(公告)号: US20070267389A1
    公开(公告)日: 2007-11-22
  • 发明人: Siegfried Straemke
  • 申请人: Siegfried Straemke
  • 优先权: DE202006007937.8 20060518
  • 主分类号: B23K9/00
  • IPC分类号: B23K9/00
Plasma treatment installation
摘要:
A plasma treatment installation comprising at least two stationary workpiece holders adapted for controlled rotation about their respective axis and having supporting plates for supporting workpieces for the treatment thereof, at least one hood to be set on a workpiece holder that is adapted to enclose each of a plurality of workpiece holders to form a sealed treatment space, and a manipulator for automatically equipping the supporting plates of a workpiece holder with workpieces, while the other workpiece holder is covered by the hood to perform the plasma treatment of the workpieces.
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