Invention Application
- Patent Title: Lithographic apparatus and method of reducing thermal distortion
- Patent Title (中): 平版印刷设备和减少热变形的方法
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Application No.: US11440437Application Date: 2006-05-25
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Publication No.: US20070273851A1Publication Date: 2007-11-29
- Inventor: Jozef Finders , Erik Loopstra
- Applicant: Jozef Finders , Erik Loopstra
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
A lithographic apparatus is disclosed that has a heater configured to supply energy to a patterning device to heat the patterning device to form a desired thermal distortion pattern of the patterning device and a controller configured to effect an optical correction in the apparatus corresponding to the desired thermal distortion pattern to reduce the effect of thermal distortion of the patterning device on a pattern.
Public/Granted literature
- US07359029B2 Lithographic apparatus and method of reducing thermal distortion Public/Granted day:2008-04-15
Information query
