发明申请
US20070279609A1 Device for Changing Pitch Between Light Beam Axes, and Substrate Exposure Apparatus
有权
用于改变光束轴之间的间距的装置和基板曝光装置
- 专利标题: Device for Changing Pitch Between Light Beam Axes, and Substrate Exposure Apparatus
- 专利标题(中): 用于改变光束轴之间的间距的装置和基板曝光装置
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申请号: US11755361申请日: 2007-05-30
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公开(公告)号: US20070279609A1公开(公告)日: 2007-12-06
- 发明人: Yoshitada OSHIDA , Yoshitatsu Naito , Mituhiro Suzuki , Tsuyoshi Yamaguchi , Shigenobu Maruyama
- 申请人: Yoshitada OSHIDA , Yoshitatsu Naito , Mituhiro Suzuki , Tsuyoshi Yamaguchi , Shigenobu Maruyama
- 申请人地址: JP Ebina-shi
- 专利权人: Hitachi Via Mechanics, Ltd.
- 当前专利权人: Hitachi Via Mechanics, Ltd.
- 当前专利权人地址: JP Ebina-shi
- 优先权: JP2006-150431 20060530
- 主分类号: G03B27/42
- IPC分类号: G03B27/42
摘要:
A parallel glass which is a prism having a parallelogram-shaped cross section in an x-y direction, and parallel glasses which are prisms having a parallelogram-shaped cross section in the x-y direction and each include grooves formed in one surface in a z direction perpendicular to the x-y direction, are stacked in direct contact with each other such that the grooves are located on the inside, and light trying to enter the grooves is subjected is total reflection, thereby changing incident parallel beams with a pitch of 13 mm into emergent parallel beams with a pitch of 1 mm.
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