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    Pattern exposure method and apparatus
    2.
    发明申请
    Pattern exposure method and apparatus 审中-公开
    图案曝光方法和装置

    公开(公告)号：US20060215139A1

    公开(公告)日：2006-09-28

    申请号：US11353017

    申请日：2006-02-14

    申请人： Yoshitada Oshida ,  Yoshitatsu Naito ,  Mituhiro Suzuki ,  Tsuyoshi Yamaguchi ,  Shigenobu Maruyama

    发明人： Yoshitada Oshida ,  Yoshitatsu Naito ,  Mituhiro Suzuki ,  Tsuyoshi Yamaguchi ,  Shigenobu Maruyama

    IPC分类号： G03B27/52

    CPC分类号： G02B26/12 ,  G02B26/123 ,  G03F7/70383 ,  G03F7/70466 ,  G03F7/70575 ,  G03F7/70791

    摘要： A maskless exposure method and a maskless exposure apparatus in which maskless exposure can be performed efficiently with high-directivity illumination light, while the exposure efficiency of solder resist can be improved. Blue-violet semiconductor lasers 12A emitting laser beams 1a with a wavelength of 405 nm and ultraviolet semiconductor lasers 12B emitting laser beams 1b with a wavelength of 375 nm are provided to irradiate a substrate 8 with the laser beams 1a and 1b whose optical axes are made coaxial. In this event, one and the same place on the substrate 8 is irradiated with the laser beams 1a and 1b a plurality of times. Thus, the variation in intensity of the laser beams 1a and 1b is averaged.

    摘要翻译： 可以通过高方向性照明光有效地进行无掩模曝光的无掩模曝光方法和无掩模曝光装置，同时可以提高阻焊剂的曝光效率。 提供波长为405nm的蓝紫色半导体激光器12A和发射波长为375nm的激光束1b的紫外半导体激光器12B以激光束1a和1照射基板8 b的光轴是同轴的。 在这种情况下，多次地用激光束1a和1b照射基板8上的同一个位置。 因此，激光束1a和1b的强度变化是平均的。

    Illuminating method, exposing method, and device for therefor
    4.
    发明申请
    Illuminating method, exposing method, and device for therefor 审中-公开
    照明方法，曝光方法和装置

    公开(公告)号：US20050219493A1

    公开(公告)日：2005-10-06

    申请号：US10506540

    申请日：2003-07-02

    申请人： Yoshitada Oshida ,  Shigenobu Maruyama ,  Kazuo Kobayashi ,  Yoshihisa Osaka

    发明人： Yoshitada Oshida ,  Shigenobu Maruyama ,  Kazuo Kobayashi ,  Yoshihisa Osaka

    IPC分类号： G02B3/00 ,  G02B19/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/54

    CPC分类号： G03F7/70075 ,  G02B3/005 ,  G02B3/0062 ,  G02B19/0014 ,  G02B19/0057 ,  G03F7/7005

    摘要： The present invention provides a light exposure apparatus, and its method, comprising: an illumination optical system including: a light source array formed of a plural separate light sources arranged one-dimensionally or two-dimensionally; condensing optical system for condensing light emitted from each light source of the light source array; a light integrator for spatially decomposing the light condensed by the condensing optics, and thus generating a multitude of pseudo-secondary light sources; and a condenser lens for overlapping the light rays emitted from the multitude of pseudo-secondary light sources generated by the light integrator, and thus illuminating an illumination target region having a pattern to be exposed; and a projection optical system for projecting transmitted or reflected light onto an exposure target region of an exposure target object in order to expose the pattern to be exposed that is illuminated by the illumination optical system.

    摘要翻译： 本发明提供一种曝光装置及其方法，包括：照明光学系统，包括：由一维或二维排列的多个单独的光源形成的光源阵列; 聚光光学系统，用于聚集从光源阵列的每个光源发射的光; 光积分器，用于空间分解由聚光光学器件聚光的光，从而产生大量的伪二次光源; 以及聚光透镜，用于将由光积分器产生的多个伪二次光源发射的光线重叠，从而照射具有待曝光图案的照明目标区域; 以及投影光学系统，用于将透射或反射的光投射到曝光目标物体的曝光目标区域上，以暴露由照明光学系统照射的待曝光图案。

    Fault inspection device and fault inspection method
    5.
    发明授权
    Fault inspection device and fault inspection method 有权
    故障检查装置及故障检查方法

    公开(公告)号：US08804110B2

    公开(公告)日：2014-08-12

    申请号：US13703414

    申请日：2011-05-20

    申请人： Yuta Urano ,  Shigenobu Maruyama ,  Toshiyuki Nakao ,  Toshifumi Honda ,  Yukihiro Shibata

    发明人： Yuta Urano ,  Shigenobu Maruyama ,  Toshiyuki Nakao ,  Toshifumi Honda ,  Yukihiro Shibata

    IPC分类号： G01N21/00 ,  G01N21/95 ,  G01N21/94 ,  G01N21/956

    CPC分类号： G01N21/94 ,  G01N21/47 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/4711 ,  G01N2021/8867 ,  G01N2021/8874 ,  G01N2201/0806 ,  G01N2201/10

    摘要： Proposed is a defect inspection method whereby: illuminating light having a substantially uniform illumination intensity distribution in one direction of a sample surface irradiated on the sample surface; multiple scattered light components, which are output in multiple independent directions, are detected among the scattered light from the sample surface and multiple corresponding scattered light detection signals are obtained; at least one of the multiple scattered light detection signals is processed and the presence of defects is determined; at least one of the multiple scattered light detection signals that correspond to each of the points determined by the processing as a defect is processed and the dimensions of the defect are determined; and the position and dimensions of the defect on the sample surface, at each of the points determined as a defect, are displayed.

    摘要翻译： 提出了一种缺陷检查方法，其中：照射在样品表面上的样品表面的一个方向具有基本上均匀的照明强度分布的光; 在来自样品表面的散射光中检测多个独立方向输出的多个散射光分量，并获得多个相应的散射光检测信号; 处理多个散射光检测信号中的至少一个并确定缺陷的存在; 处理与通过处理确定的每个点对应的多个散射光检测信号中的至少一个作为缺陷，并确定缺陷的尺寸; 并且显示在被确定为缺陷的每个点处的样品表面上的缺陷的位置和尺寸。

    Defect inspecting method and defect inspecting apparatus
    6.
    发明授权
    Defect inspecting method and defect inspecting apparatus 失效
    缺陷检查方法和缺陷检查装置

    公开(公告)号：US08638429B2

    公开(公告)日：2014-01-28

    申请号：US13146428

    申请日：2009-12-15

    申请人： Toshiyuki Nakao ,  Shigenobu Maruyama ,  Akira Hamamatsu ,  Yuta Urano

    发明人： Toshiyuki Nakao ,  Shigenobu Maruyama ,  Akira Hamamatsu ,  Yuta Urano

    IPC分类号： G01N21/00 ,  G01J4/00

    CPC分类号： G01N21/9501 ,  G01N21/8806 ,  G01N2021/8809 ,  G01N2021/8848 ,  H01L22/12

    摘要： Provided are a defect inspecting method and a defect inspecting apparatus, wherein defect detecting sensitivity is improved and also haze measurement is performed using polarization detection, while suppressing damages to samples. The defect inspecting apparatus is provided with a light source which oscillates to a sample a laser beam having a wavelength band wherein a small energy is absorbed, and two independent detecting optical systems, i.e., a defect detecting optical system which detects defect scattered light generated by a defect, by radiating the laser beams oscillated by the light source, and a haze detecting optical system which detects roughness scattered light generated due to roughness of the wafer surface. Polarization detection is independently performed with respect to the scattered light detected by the two detecting optical systems, and based on the two different detection signals, defect determination and haze measurement are performed.

    摘要翻译： 提供了一种缺陷检查方法和缺陷检查装置，其中提高了缺陷检测灵敏度，并且在抑制对样本的损害的同时使用偏振检测进行雾度测量。 缺陷检查装置具有向样品振荡的光源，其具有吸收小能量的波长带的激光束，以及两个独立的检测光学系统，即检测由 通过照射由光源振荡的激光束的缺陷，以及检测由于晶片表面的粗糙度而产生的粗糙度散射光的雾度检测光学系统。 相对于由两个检测光学系统检测的散射光独立地进行极化检测，并且基于两个不同的检测信号，执行缺陷确定和雾度测量。

    Adjustable Beam Size Illumination Optical Apparatus and Beam Size Adjusting Method
    8.
    发明申请
    Adjustable Beam Size Illumination Optical Apparatus and Beam Size Adjusting Method 审中-公开
    可调节光束尺寸照明光学装置和光束尺寸调整方法

    公开(公告)号：US20110228537A1

    公开(公告)日：2011-09-22

    申请号：US13049089

    申请日：2011-03-16

    申请人： Keiko YOSHIMIZU ,  Hiroshi Aoyama ,  Shigenobu Maruyama ,  Yasuhiro Yoshitake

    发明人： Keiko YOSHIMIZU ,  Hiroshi Aoyama ,  Shigenobu Maruyama ,  Yasuhiro Yoshitake

    IPC分类号： F21V5/04

    CPC分类号： G02B27/0955

    摘要： An adjustable beam size illumination optical apparatus includes a beam size adjusting optical system which includes groups of cylindrical array lenses disposed correspondingly to the long and short axis directions respectively and having variable intervals among the lenses, and a group of cylindrical telescope lenses disposed correspondingly to one of the long and short axis directions and having variable intervals among the lenses, and adjusts parallel light from a light source in size in accordance with the two axis directions orthogonal to each other. The lens interval of one of the cylindrical array lens groups and the cylindrical telescope lens group is changed to adjust a beam size on a projection surface in accordance with the long axis direction or the short axis direction. Thus, it is possible to adjust the beam size in accordance with the long axis direction and the short axis direction individually, and it is possible to make irradiation with the beam with uniform intensity.

    摘要翻译： 可调光束尺寸照明光学装置包括光束尺寸调整光学系统，该光束尺寸调整光学系统包括分别对应于长轴和短轴方向设置的圆柱形阵列透镜组，并且在透镜之间具有可变的间隔，以及一组圆柱形望远镜，其对应于一个 并且在透镜中具有可变的间隔，并且根据彼此正交的两个轴方向来调整来自光源的尺寸的平行光。 根据长轴方向或短轴方向，改变圆柱形阵列透镜组和圆柱形望远镜透镜组中的一个的透镜间隔，以调整投影表面上的光束尺寸。 因此，可以分别根据长轴方向和短轴方向调整光束尺寸，并且可以以均匀的强度对光束进行照射。

    Apparatus and method for determining surface profiles using a scanning probe microscope
    9.
    发明申请
    Apparatus and method for determining surface profiles using a scanning probe microscope 有权
    使用扫描探针显微镜确定表面轮廓的装置和方法

    公开(公告)号：US20060097162A1

    公开(公告)日：2006-05-11

    申请号：US11251795

    申请日：2005-10-18

    申请人： Shigenobu Maruyama ,  Mineo Nomoto ,  Toru Kurenuma ,  Yuichi Kunitomo ,  Yukio Kembo

    发明人： Shigenobu Maruyama ,  Mineo Nomoto ,  Toru Kurenuma ,  Yuichi Kunitomo ,  Yukio Kembo

    IPC分类号： G21K7/00

    CPC分类号： G01Q10/04

    摘要： A scanning probe microscope for measuring a surface profile of a sample by bringing a probe into close proximity to or contact with the surface of the sample and scanning the sample surface includes: a sample stage movable in at least one axis direction; the probe which is brought into close proximity to or contact with the surface of the sample mounted on the sample stage and scans the sample surface; a probe-driving unit for moving the probe three-dimensionally; a probe deflection detector for detecting a deflection of the probe; and an observation optical system which has an objective lens and observes the probe disposed on substantially the optical axis of the objective lens, and the sample. The probe-driving unit is disposed with three sets of paired drive sources arranged essentially with symmetry with respect to the optical axis of the objective lens.

    摘要翻译： 一种扫描探针显微镜，用于通过使探针靠近或接触样品的表面并扫描样品表面来测量样品的表面轮廓，包括：可在至少一个轴向移动的样品台; 该探头与安装在样品台上的样品的表面紧密接触或接触并扫描样品表面; 用于三维移动探头的探针驱动单元; 用于检测探针偏转的探针偏转检测器; 以及观察光学系统，其具有物镜并观察设置在物镜的基本光轴上的探针和样品。 探针驱动单元设置有三组成对的驱动源，其基本上相对于物镜的光轴对称布置。