发明申请
- 专利标题： Imprint lithography apparatus and methods
- 专利标题（中）： 压印光刻设备及方法
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申请号： US11451993申请日： 2006-06-13
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公开(公告)号： US20070284779A1公开(公告)日： 2007-12-13
- 发明人: Wei Wu , Shih-Yuan Wang , Zhaoning Yu , R. Stanley Williams
- 申请人： Wei Wu , Shih-Yuan Wang , Zhaoning Yu , R. Stanley Williams
- 主分类号： B29C35/08
- IPC分类号： B29C35/08 ; B29C59/00
摘要：
An apparatus for forming a pattern in a curable material carried on a substrate having one or more components with coefficients of thermal expansion that are substantially equal to the coefficient of thermal expansion of the substrate.
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