发明申请
- 专利标题: METHOD OF MANUFACTURING INK JET RECORDING HEAD, INK JET RECORDING HEAD, AND INK JET CARTRIDGE
- 专利标题(中): 喷墨记录头制造方法,喷墨记录头和喷墨盒
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申请号: US11840404申请日: 2007-08-17
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公开(公告)号: US20070289942A1公开(公告)日: 2007-12-20
- 发明人: KENJI FUJII , Shuji Koyama , Masaki Osumi , Shingo Nagata , Jun Yamanuro , Yoshinori Tagawa , Hiroyuki Murayama , Yoshinobu Urayama
- 申请人: KENJI FUJII , Shuji Koyama , Masaki Osumi , Shingo Nagata , Jun Yamanuro , Yoshinori Tagawa , Hiroyuki Murayama , Yoshinobu Urayama
- 申请人地址: JP TOKYO
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: JP TOKYO
- 优先权: JP2003-399219 20031128; JP2004-319362 20041102
- 主分类号: G11B5/127
- IPC分类号: G11B5/127
摘要:
A method of manufacturing an ink jet head which discharges ink, comprising: a step of preparing a silicon substrate; a step of forming a membrane having a layer in which a plurality of holes are disposed to constitute a filter mask, and a layer with which a first surface is coated in such a manner that the first surface is not exposed from the plurality of holes on the first surface of the substrate; a step of forming a close contact enhancing layer on the membrane formed on the substrate; a step of forming a channel constituting member on the close contact enhancing layer to constitute a plurality of discharge ports and a plurality of ink channels communicating with the plurality of discharge ports; a step of forming an ink supply port communicating with the plurality of ink channels in the silicon substrate by anisotropic etching from a second surface facing the first surface of the substrate; and a step of forming a filter in a portion of the close contact enhancing layer positioned in an opening of the ink supply port using the layer of the membrane in which a plurality of holes are disposed as the mask.
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