发明申请
- 专利标题: Structure for a non-volatile memory device
- 专利标题(中): 非易失性存储器件的结构
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申请号: US11453357申请日: 2006-06-15
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公开(公告)号: US20070291526A1公开(公告)日: 2007-12-20
- 发明人: Tzyh-Cheang Lee , Fu-Liang Yang
- 申请人: Tzyh-Cheang Lee , Fu-Liang Yang
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 主分类号: G11C17/00
- IPC分类号: G11C17/00
摘要:
System for a memory device. An electronic device includes a non-volatile memory array. The non-volatile memory array includes a first transistor and a second transistor. The first and second transistors have a shared doped region. A first word line is formed along a first axis. The first word line includes a first gate electrode for the first transistor and a second gate electrode for the second transistor. The non-volatile memory array includes a bit line formed along a second axis. The first axis is perpendicular to the second axis. The bit line is electrically connected to the shared doped region.