发明申请
US20080001262A1 Silicon level solution for mitigation of substrate noise 审中-公开
硅片解决方案,用于减轻衬底噪声

  • 专利标题: Silicon level solution for mitigation of substrate noise
  • 专利标题(中): 硅片解决方案,用于减轻衬底噪声
  • 申请号: US11479583
    申请日: 2006-06-29
  • 公开(公告)号: US20080001262A1
    公开(公告)日: 2008-01-03
  • 发明人: Telesphor Kamgaing
  • 申请人: Telesphor Kamgaing
  • 主分类号: H01L23/552
  • IPC分类号: H01L23/552
Silicon level solution for mitigation of substrate noise
摘要:
The techniques described herein reduce the substrate noise current that exists when digital and analog components reside on the same microelectronic die. Single or multiple rows of isolation vias form isolation barriers between the individual circuit blocks. The isolation vias may be hollow or (lined or filled) with a conductive or non-conductive material.
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