发明申请
- 专利标题： RFID tag manufacturing method and RFID tag
- 专利标题（中）： RFID标签制造方法和RFID标签
-
申请号： US11656519申请日： 2007-01-23
-
公开(公告)号： US20080001759A1公开(公告)日： 2008-01-03
- 发明人: Hiroshi Kobayashi , Naoki Ishikawa , Takayoshi Matsumura
- 申请人： Hiroshi Kobayashi , Naoki Ishikawa , Takayoshi Matsumura
- 申请人地址： JP Kawasaki-shi
- 专利权人： FUJITSU LIMITED
- 当前专利权人： FUJITSU LIMITED
- 当前专利权人地址： JP Kawasaki-shi
- 优先权： JP2006-181814 20060630
- 主分类号： G08B13/14
- IPC分类号： G08B13/14 ; H01L21/00 ; H01Q17/00
摘要：
An RFID tag manufacturing method manufactures an RFID tag which has flattened surfaces and serves as a metal tag. The method includes a surface-layer-forming step of forming a surface layer having a predetermined thickness on a base plate on which a metal antenna pattern is formed and a mounting step for mounting a circuit chip on the base plate such that the circuit chip is connected to the both ends of the metal antenna pattern.
信息查询
