发明申请
- 专利标题: 3C-SiC nanowhisker and synthesizing method of the same
- 专利标题(中): 3C-SiC纳米晶须及其合成方法
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申请号: US11648569申请日: 2007-01-03
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公开(公告)号: US20080003162A1公开(公告)日: 2008-01-03
- 发明人: Toshihiro Ando , Mika Gamo , Yafei Zhang
- 申请人: Toshihiro Ando , Mika Gamo , Yafei Zhang
- 申请人地址: JP Kawaguchi-shi JP Tsukuba-shi
- 专利权人: JAPAN SCIENCE AND TECHNOLOGY AGENCY,NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- 当前专利权人: JAPAN SCIENCE AND TECHNOLOGY AGENCY,NATIONAL INSTITUTE FOR MATERIALS SCIENCE
- 当前专利权人地址: JP Kawaguchi-shi JP Tsukuba-shi
- 优先权: JPJP2001-191226 20010625
- 主分类号: C01B31/36
- IPC分类号: C01B31/36
摘要:
3C-SiC nanowhisker and a method of synthesizing 3C-SiC nanowhisker wherein its diameter and length can be controlled. The method is safe and low cost, and the whisker can emit visible light of various wavelengths. 3C-SiC nanowhisker is formed by depositing thin film (2) made of a metal element on Si substrate (1), placing this Si substrate (1) into a plasma CVD apparatus, and holding it for predetermined time at predetermined substrate temperature in the plasma consisting of hydrogen and hydrocarbon. Si of Si substrate (1) and C in plasma dissolve at supersaturation into metal liquid particles (3), 3C-SiC nanowhisker (4) grows on the metal liquid particles (3), whisker surface is terminated with H so as to maintain the diameter constant, and the metal liquid particles (3) at whisker root take in Si from Si substrate (1) and penetrate into Si substrate (1).
公开/授权文献
- US07521034B2 3C-SiC nanowhisker 公开/授权日:2009-04-21
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