• 专利标题: Monolithic vertical junction field effect transistor and schottky barrier diode fabricated from silicon carbide and method for fabricating the same
  • 申请号: US11808701
    申请日: 2007-06-12
  • 公开(公告)号: US20080003731A1
    公开(公告)日: 2008-01-03
  • 发明人: Michael MazzolaJoseph Merrett
  • 申请人: Michael MazzolaJoseph Merrett
  • 主分类号: H01L21/82
  • IPC分类号: H01L21/82
Monolithic vertical junction field effect transistor and schottky barrier diode fabricated from silicon carbide and method for fabricating the same
摘要:
A switching element combining a self-aligned, vertical junction field effect transistor with etched-implanted gate and an integrated antiparallel Schottky barrier diode is described. The anode of the diode is connected to the source of the transistor at the device level in order to reduce losses due to stray inductances. The SiC surface in the SBD anode region is conditioned through dry etching to achieve a low Schottky barrier height so as to reduce power losses associated with the turn on voltage of the SBD.
信息查询
0/0