发明申请
US20080014450A1 Photocurable resin composition and article having a coating formed by curing such composition
有权
光固化树脂组合物和具有通过固化该组合物形成的涂层的制品
- 专利标题: Photocurable resin composition and article having a coating formed by curing such composition
- 专利标题(中): 光固化树脂组合物和具有通过固化该组合物形成的涂层的制品
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申请号: US11826174申请日: 2007-07-12
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公开(公告)号: US20080014450A1公开(公告)日: 2008-01-17
- 发明人: Yuji Yoshikawa , Masaaki Yamaya
- 申请人: Yuji Yoshikawa , Masaaki Yamaya
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 优先权: JP2006-192438 20060713
- 主分类号: C08F2/46
- IPC分类号: C08F2/46 ; B32B27/28
摘要:
A thermosetting resin composition which forms a cured coating is provided. This resin composition is capable of providing the supporting substrate with scratch resistance, crack resistance, smudge proof property, removability of oil-base felted markers by wiping, and antistatic property. Also provided is an article having a coating formed from such composition. More specifically, the photocurable resin composition comprises (1) a siloxane compound containing a photoreactive group produced by hydrolyzing and condensing a system comprising (a) photoreactive group-containing hydrolyzable silane represented by formula (i) or (ii), with the proviso that, when one hydrolyzable silane is used, the silane comprises a trifunctional silane, and when two or more silanes are used, at least 70% by mole comprise a trifunctional silane, (b) a dimethylsiloxane containing a hydrolyzable group at opposite ends represented by formula (iii), and (c) a fluorine-containing hydrolyzable silane represented by formula (iv) in the presence of a basic catalyst by using water at an amount in excess of the amount required for hydrolyzing and condensing all hydrolyzable groups; (3) (CF3(CF2)mSO2)2NLi (wherein m is 0 to 7); and (4) a radical photopolymerization initiator. The article has a coating formed from this composition.
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