发明申请
US20080014518A1 Process for preparing photosensitive outer layer 有权
光敏外层制备方法

Process for preparing photosensitive outer layer
摘要:
The presently disclosed embodiments are directed to an improved overcoat for an imaging member having a substrate, a charge transport layer, and an overcoat positioned on the charge transport layer, and a process for making the same including combining a resin having a reactive group selected from the group consisting of hydroxyl, carboxylic acid and amide groups, a melamine formaldehyde crosslinking agent, a formaldehyde scavenger, an acid catalyst, and an alcohol-soluble charge transporting molecule to form an overcoat solution, and subsequently providing the overcoat solution onto the charge transport layer to form an overcoat layer.
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