发明申请
- 专利标题: Process for preparing photosensitive outer layer
- 专利标题(中): 光敏外层制备方法
-
申请号: US11900712申请日: 2007-09-13
-
公开(公告)号: US20080014518A1公开(公告)日: 2008-01-17
- 发明人: John Yanus , Kenny-tuan Dinh , Jin Wu , Dale Renfer
- 申请人: John Yanus , Kenny-tuan Dinh , Jin Wu , Dale Renfer
- 申请人地址: US CT Stamford
- 专利权人: XEROX CORPORATION
- 当前专利权人: XEROX CORPORATION
- 当前专利权人地址: US CT Stamford
- 主分类号: G03G15/02
- IPC分类号: G03G15/02 ; G03G5/00
摘要:
The presently disclosed embodiments are directed to an improved overcoat for an imaging member having a substrate, a charge transport layer, and an overcoat positioned on the charge transport layer, and a process for making the same including combining a resin having a reactive group selected from the group consisting of hydroxyl, carboxylic acid and amide groups, a melamine formaldehyde crosslinking agent, a formaldehyde scavenger, an acid catalyst, and an alcohol-soluble charge transporting molecule to form an overcoat solution, and subsequently providing the overcoat solution onto the charge transport layer to form an overcoat layer.
公开/授权文献
- US08062823B2 Process for preparing photosensitive outer layer 公开/授权日:2011-11-22
信息查询