发明申请
- 专利标题: SUBSTRATE PROCESSING APPARATUS
- 专利标题(中): 基板加工设备
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申请号: US11779990申请日: 2007-07-19
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公开(公告)号: US20080017320A1公开(公告)日: 2008-01-24
- 发明人: Ho-Geun Choi , Heung-Kyou Kang , Yong-Woo Kim , Pal-Kon Kim
- 申请人: Ho-Geun Choi , Heung-Kyou Kang , Yong-Woo Kim , Pal-Kon Kim
- 优先权: KR10-2006-68074 20060720
- 主分类号: H01L21/306
- IPC分类号: H01L21/306
摘要:
A substrate processing apparatus includes a process chamber, a fixed frame, a feed unit, and a supplying unit. A substrate is mounted to the fixed frame, the supplying unit is spaced apart from respective sides of the substrate to supply process fluid to the substrate, and the feed unit transports the fixed frame parallel to a longitudinal direction of the substrate. The process is automatically performed so that loss of the substrate is reduced and the substrate is effectively processed.
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