公开(公告)号：US20080017320A1

公开(公告)日：2008-01-24

申请号：US11779990

申请日：2007-07-19

申请人： Ho-Geun Choi ,  Heung-Kyou Kang ,  Yong-Woo Kim ,  Pal-Kon Kim

发明人： Ho-Geun Choi ,  Heung-Kyou Kang ,  Yong-Woo Kim ,  Pal-Kon Kim

IPC分类号： H01L21/306

CPC分类号： H01L21/67712 ,  H01L21/67028 ,  H01L21/67051 ,  H01L21/67718 ,  H01L21/67721 ,  H01L21/6776

摘要： A substrate processing apparatus includes a process chamber, a fixed frame, a feed unit, and a supplying unit. A substrate is mounted to the fixed frame, the supplying unit is spaced apart from respective sides of the substrate to supply process fluid to the substrate, and the feed unit transports the fixed frame parallel to a longitudinal direction of the substrate. The process is automatically performed so that loss of the substrate is reduced and the substrate is effectively processed.

摘要翻译： 基板处理装置包括处理室，固定框架，进给单元和供给单元。 基板安装到固定框架上，供应单元与基板的相应侧面间隔开，以将过程流体供应到基板，并且进给单元平行于基板的纵向方向传送固定框架。 自动执行该过程，从而减少衬底的损失并且衬底被有效地加工。

公开(公告)号：US20090039054A1

公开(公告)日：2009-02-12

申请号：US12100793

申请日：2008-04-10

申请人： Ho-Geun CHOI ,  Yong-Woo KIM ,  Myoung-Ki LEE ,  Pal-Kon KIM

发明人： Ho-Geun CHOI ,  Yong-Woo KIM ,  Myoung-Ki LEE ,  Pal-Kon KIM

IPC分类号： B29D11/00 ,  C03C15/00

CPC分类号： H01L21/68707 ,  C03C15/00 ,  G02F1/1303 ,  H01L21/6708

摘要： An etching apparatus of a glass substrate for a flat panel display includes an etching chamber configured to receive a jig, glass substrates disposed on the jig, a holding member connected to the jig to hold the glass substrates, a transferring line connected to the jig to transfer the jig into the etching chamber, and a spray member which sprays an etchant onto surfaces of the glass substrates. A spray pressure of the etchant is equal to or greater than approximately 0.1 kg/cm2 and is less than approximately 0.5 kg/cm2.

摘要翻译： 用于平板显示器的玻璃基板的蚀刻装置包括：被配置为容纳夹具的蚀刻室，设置在夹具上的玻璃基板，与夹具连接以保持玻璃基板的保持部件，连接到夹具的传送线 将夹具转移到蚀刻室中，以及将蚀刻剂喷射到玻璃基板的表面上的喷涂构件。 蚀刻剂的喷雾压力等于或大于约0.1kg / cm 2，并且小于约0.5kg / cm 2。