发明申请
US20080017807A1 DEFLECTOR ARRAY, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
有权
偏转器阵列，曝光装置和装置制造方法
- 专利标题： DEFLECTOR ARRAY, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
- 专利标题（中）： 偏转器阵列，曝光装置和装置制造方法
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申请号： US11779498申请日： 2007-07-18
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公开(公告)号： US20080017807A1公开(公告)日： 2008-01-24
- 发明人: Kenichi Nagae , Masatoshi Kanamaru
- 申请人： Kenichi Nagae , Masatoshi Kanamaru
- 申请人地址： JP Tokyo JP Tokyo
- 专利权人： CANON KABUSHIKI KAISHA,HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人： CANON KABUSHIKI KAISHA,HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人地址： JP Tokyo JP Tokyo
- 优先权： JP2006-197747(PAT.) 20060720
- 主分类号： G21K1/087
- IPC分类号： G21K1/087
摘要：
This invention discloses a deflector array in which a plurality of deflectors which deflect charged particle beams are arrayed on a substrate. Each deflector includes an opening formed on the substrate, and a pair of electrodes opposing each other through the opening. The length of the pair of electrodes in the longitudinal direction is not less than the distance between the centers of two deflectors equivalent to the plurality of deflectors, which are located nearest to each other.
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