发明申请
US20080020559A1 PAD STRUCTURE DESIGN WITH REDUCED DENSITY 有权
PAD结构设计与降低密度

PAD STRUCTURE DESIGN WITH REDUCED DENSITY
摘要:
An interconnect structure includes at least a first interconnect layer and a second interconnect layer. Each of the first and second interconnect layers has a pad structure and each pad structure has a respective pad density. The pad density of the pad structure of the second interconnect layer is different from the pad density of the pad structure of the first interconnect layer. The pad structures of the first and second interconnect layers are connected to each other.
公开/授权文献
信息查询
0/0