发明申请
US20080023143A1 Capacitively coupled plasma reactor with magnetic plasma control
审中-公开
具有磁等离子体控制的电容耦合等离子体反应器
- 专利标题： Capacitively coupled plasma reactor with magnetic plasma control
- 专利标题（中）： 具有磁等离子体控制的电容耦合等离子体反应器
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申请号： US11881801申请日： 2007-07-27
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公开(公告)号： US20080023143A1公开(公告)日： 2008-01-31
- 发明人: Daniel Hoffman , Matthew Miller , Jang Yang , Heeyeop Chae , Michael Barnes , Tetsuya Ishikawa , Yan Ye
- 申请人： Daniel Hoffman , Matthew Miller , Jang Yang , Heeyeop Chae , Michael Barnes , Tetsuya Ishikawa , Yan Ye
- 主分类号： H01L21/3065
- IPC分类号： H01L21/3065 ; H01L21/285
摘要：
A plasma reactor includes a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within the chamber and facing the ceiling for supporting a planar workpiece, the workpiece support and the ceiling together defining a processing region between the workpiece support and the ceiling. Process gas inlets furnish a process gas into the chamber. A plasma source power electrode is connected to an RF power generator for capacitively coupling plasma source power into the chamber for maintaining a plasma within the chamber. The reactor further includes at least a first overhead solenoidal electromagnet adjacent the ceiling, the overhead solenoidal electromagnet, the ceiling, the side wall and the workpiece support being located along a common axis of symmetry.
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