Invention Application
- Patent Title: Field Emission Devices
- Patent Title (中): 现场排放装置
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Application No.: US11857879Application Date: 2007-09-19
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Publication No.: US20080024048A1Publication Date: 2008-01-31
- Inventor: Cheng-Chung LEE , Yu-Yang CHANG , Ming-Hung LIN , Bing-Nan LIN
- Applicant: Cheng-Chung LEE , Yu-Yang CHANG , Ming-Hung LIN , Bing-Nan LIN
- Applicant Address: TW Chutung
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Chutung
- Main IPC: H01J7/24
- IPC: H01J7/24

Abstract:
A field emission device comprising a first substrate, a second substrate spaced apart from the first substrate, a first metal layer on the first substrate, the first metal layer including a number of first metal lines, a second metal layer over the first metal layer, the second metal layer including a number of second metal lines, emitters over the first metal layer, the emitters being configured to emit electrons toward the second substrate, a luminescent layer between the first substrate and the second substrate, the luminescent layer being configured to provide light when the electrons impinge thereon, and a third metal layer between the second substrate and the luminescent layer, the third metal layer being configured to reflect the light from the luminescent layer toward the first substrate, wherein the first metal lines are substantially parallel to the second metal lines.
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