Invention Application
US20080028958A1 Imprinting apparatus and method for forming residual film on a substrate
有权
用于在基板上形成残留膜的印刷装置和方法
- Patent Title: Imprinting apparatus and method for forming residual film on a substrate
- Patent Title (中): 用于在基板上形成残留膜的印刷装置和方法
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Application No.: US11882363Application Date: 2007-08-01
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Publication No.: US20080028958A1Publication Date: 2008-02-07
- Inventor: Dae Jin Park , Kyu Young Kim , Jung Mok Bae , Ju Han Bae
- Applicant: Dae Jin Park , Kyu Young Kim , Jung Mok Bae , Ju Han Bae
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2006-0072612 20060801; KR10-2007-0001522 20070105
- Main IPC: B41F7/00
- IPC: B41F7/00 ; G02B1/12

Abstract:
An imprinting apparatus and a method of the same which form a residual film including a uniform thickness all over a substrate. The imprinting apparatus includes a substrate support which supports a substrate which is coated with an imprint resin on an upper surface thereof, an imprint mold arranged on an upper side of the substrate support and which forms a predetermined pattern by molding the imprint resin coated on the substrate, a pressure roller which pressurizes the imprint mold to adhere closely to the substrate, a pressure roller control unit which controls the pressure roller to change a moving velocity and an applied pressure of the pressure roller according to a position of the imprint mold, and a resin curing unit which cures the imprint resin on the substrate.
Public/Granted literature
- US07807087B2 Imprinting apparatus and method for forming residual film on a substrate Public/Granted day:2010-10-05
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