Invention Application
US20080028958A1 Imprinting apparatus and method for forming residual film on a substrate 有权
用于在基板上形成残留膜的印刷装置和方法

Imprinting apparatus and method for forming residual film on a substrate
Abstract:
An imprinting apparatus and a method of the same which form a residual film including a uniform thickness all over a substrate. The imprinting apparatus includes a substrate support which supports a substrate which is coated with an imprint resin on an upper surface thereof, an imprint mold arranged on an upper side of the substrate support and which forms a predetermined pattern by molding the imprint resin coated on the substrate, a pressure roller which pressurizes the imprint mold to adhere closely to the substrate, a pressure roller control unit which controls the pressure roller to change a moving velocity and an applied pressure of the pressure roller according to a position of the imprint mold, and a resin curing unit which cures the imprint resin on the substrate.
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