发明申请
- 专利标题: SEMICONDUCTOR SUBSTRATE CLEANING SYSTEM
- 专利标题(中): 半导体衬底清洗系统
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申请号: US11877648申请日: 2007-10-23
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公开(公告)号: US20080041422A1公开(公告)日: 2008-02-21
- 发明人: Brian Brown , Anwar Husain , Fred Redeker
- 申请人: Brian Brown , Anwar Husain , Fred Redeker
- 主分类号: B08B7/04
- IPC分类号: B08B7/04 ; B08B3/00
摘要:
A modular semiconductor substrate cleaning system is provided that processes vertically oriented semiconductor substrates. The system features a plurality of cleaning modules that may include a megasonic tank-type cleaner followed by a scrubber. An input module may receive a horizontally oriented substrate and rotate the substrate to a vertical orientation, and an output module may receive a vertically oriented substrate and rotate the substrate to a horizontal orientation. Each of the modules (input, cleaning and output) has a substrate support and may be positioned such that the substrate supports of adjacent modules are equally spaced. The modules are coupled by an overhead transfer mechanism having a plurality of substrate handlers spaced the same distance (X) as the substrate supports of the modules therebelow. The transfer mechanism indexes forward and backward the distance X to simultaneously transport semiconductor substrates through the cleaning system, lifting and lowering substrates from the desired modules wafer rotation/orientation sensors, an input module cart for transporting wafers between a substrate handler of a previous tool (such as a semiconductor substrate polisher) and a substrate handler of the cleaning system are also included.
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