发明申请
US20080042074A1 CHARGED PARTICLE BEAM APPARATUS AND CHARGED PARTICLE BEAM IRRADIATION METHOD
有权
充电颗粒光束装置和充电颗粒光束辐射方法
- 专利标题: CHARGED PARTICLE BEAM APPARATUS AND CHARGED PARTICLE BEAM IRRADIATION METHOD
- 专利标题(中): 充电颗粒光束装置和充电颗粒光束辐射方法
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申请号: US11841411申请日: 2007-08-20
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公开(公告)号: US20080042074A1公开(公告)日: 2008-02-21
- 发明人: MITSUGU SATO , Hideo Todokoro , Yoichi Ose , Makoto Ezumi , Noriaki Arai , Takashi Doi
- 申请人: MITSUGU SATO , Hideo Todokoro , Yoichi Ose , Makoto Ezumi , Noriaki Arai , Takashi Doi
- 优先权: JP2002-265842 20020911; JP2003-305267 20030828
- 主分类号: H01J3/14
- IPC分类号: H01J3/14
摘要:
A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses 6 and 7 off the axes thereof. A means is provided to control the off-axis trajectory of the beam such than an aberration produced by the objective lens 7 when the beam is inclined can be canceled by an aberration produced by the other lens 6.
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