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    Charged particle beam apparatus
    6.
    发明申请
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US20090294697A1

    公开(公告)日：2009-12-03

    申请号：US12453986

    申请日：2009-05-28

    申请人： Souichi Katagiri ,  Takashi Ohshima ,  Sho Takami ,  Makoto Ezumi ,  Takashi Doi ,  Yuji Kasai

    发明人： Souichi Katagiri ,  Takashi Ohshima ,  Sho Takami ,  Makoto Ezumi ,  Takashi Doi ,  Yuji Kasai

    IPC分类号： A61N5/00 ,  G21F5/02

    CPC分类号： H01J37/18 ,  H01J2237/06341 ,  H01J2237/182 ,  H01J2237/188

    摘要： The present invention provides a charged particle beam apparatus that keeps the degree of vacuum in the vicinity of the electron source to ultra-high vacuum such as 10−8 to 10−9 Pa even in the state where electron beams are emitted using a non-evaporable getter pump and is not affected by dropout foreign particles.The present invention includes a vacuum vessel in which a charged particle source (electron source, ion source, etc.) is disposed and a non-evaporable getter pump disposed at a position that does not directly face electron beams and includes a structure that makes the non-evaporable getter pump upward with respect to a horizontal direction to drop out foreign particles into a bottom in a groove, so that the foreign particles dropped out from the non-evaporable getter pump do not face an electron optical system. Or, the present invention includes a structure that is covered by a shield means, or a means that is disposed immediately on a surface of the non-evaporable getter pump but at a position where the electron beams are not seen and has a concave structure capable of trapping the dropout foreign particles on a lower portion of the non-evaporable getter pump.

    摘要翻译： 本发明提供了一种带电粒子束装置，其将电子源附近的真空度保持为10-8至10-9Pa的超高真空度，即使在使用非电子束发射电子束的状态下， 可蒸发吸气泵，不受脱落异物的影响。 本发明包括设置有带电粒子源（电子源，离子源等）的真空容器和设置在不直接面向电子束的位置的非蒸发性吸气泵，并且包括使 不可蒸发的吸气剂相对于水平方向向上泵送以将异物排出到槽中的底部，使得从非蒸发性吸气泵排出的异物不面向电子光学系统。 或者，本发明包括被屏蔽装置覆盖的结构，或者立即设置在不可蒸发的吸气泵的表面上，但是在不能看到电子束的位置处并具有凹形结构的装置 在非蒸发性吸气泵的下部捕获脱落的异物。

    Charged particle beam apparatus
    7.
    发明授权
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US08686380B2

    公开(公告)日：2014-04-01

    申请号：US12453986

    申请日：2009-05-28

    申请人： Souichi Katagiri ,  Takashi Ohshima ,  Sho Takami ,  Makoto Ezumi ,  Takashi Doi ,  Yuji Kasai

    发明人： Souichi Katagiri ,  Takashi Ohshima ,  Sho Takami ,  Makoto Ezumi ,  Takashi Doi ,  Yuji Kasai

    IPC分类号： G21G5/00

    CPC分类号： H01J37/18 ,  H01J2237/06341 ,  H01J2237/182 ,  H01J2237/188

    摘要： The present invention provides a charged particle beam apparatus that keeps the degree of vacuum in the vicinity of the electron source to ultra-high vacuum such as 10−8 to 10−9 Pa even in the state where electron beams are emitted using a non-evaporable getter pump and is not affected by dropout foreign particles.The present invention includes a vacuum vessel in which a charged particle source (electron source, ion source, etc.) is disposed and a non-evaporable getter pump disposed at a position that does not directly face electron beams and includes a structure that makes the non-evaporable getter pump upward with respect to a horizontal direction to drop out foreign particles into a bottom in a groove, so that the foreign particles dropped out from the non-evaporable getter pump do not face an electron optical system. Or, the present invention includes a structure that is covered by a shield means, or a means that is disposed immediately on a surface of the non-evaporable getter pump but at a position where the electron beams are not seen and has a concave structure capable of trapping the dropout foreign particles on a lower portion of the non-evaporable getter pump.

    摘要翻译： 本发明提供了一种带电粒子束装置，其将电子源附近的真空度保持为10-8至10-9Pa的超高真空度，即使在使用非电子束发射电子束的状态下， 可蒸发吸气泵，不受脱落异物的影响。 本发明包括设置有带电粒子源（电子源，离子源等）的真空容器和设置在不直接面向电子束的位置的非蒸发性吸气泵，并且包括使 不可蒸发的吸气剂相对于水平方向向上泵送以将异物排出到槽中的底部，使得从非蒸发性吸气泵排出的异物不面向电子光学系统。 或者，本发明包括被屏蔽装置覆盖的结构，或者立即设置在不可蒸发的吸气泵的表面上，但是在不能看到电子束的位置处并具有凹形结构的装置 在非蒸发性吸气泵的下部捕获脱落的异物。

    Charged particle beam adjusting method and charged particle beam apparatus
    9.
    发明授权
    Charged particle beam adjusting method and charged particle beam apparatus 有权
    带电粒子束调节法和带电粒子束装置

    公开(公告)号：US07705300B2

    公开(公告)日：2010-04-27

    申请号：US11104631

    申请日：2005-04-13

    申请人： Hidetoshi Morokuma ,  Noriaki Arai ,  Takashi Doi ,  Fumihiro Sasajima ,  Yoshihiro Kimura

    发明人： Hidetoshi Morokuma ,  Noriaki Arai ,  Takashi Doi ,  Fumihiro Sasajima ,  Yoshihiro Kimura

    IPC分类号： G01N23/00

    CPC分类号： H01J37/21 ,  H01J37/153 ,  H01J2237/216 ,  H01J2237/221

    摘要： In an apparatus for obtaining an image by irradiating a charged particle beam on a specimen, a condition of the beam conditioned differently from vertical incidence as in the case of the beam being tilted is required to be adjusted. To this end, the apparatus has a controller for automatically controlling a stigmator, an objective lens and a deflector such that astigmatism is corrected, focus is adjusted and view filed shift is corrected. The controller has a selector for inhibiting at least one of the astigmatism correction, focus adjustment and FOV shift correction from being executed.

    摘要翻译： 在用于通过将带电粒子束照射在样本上来获得图像的装置中，需要调整如在光束倾斜的情况下不同于垂直入射而调节的光束的条件。 为此，该装置具有用于自动控制瞄光器，物镜和偏转器的控制器，从而校正像散，调整焦点并校正视野移动。 控制器具有用于禁止执行散光校正，聚焦调整和FOV偏移校正中的至少一个的选择器。