发明申请
- 专利标题: Method for manufacturing display device
- 专利标题(中): 显示装置制造方法
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申请号: US11823095申请日: 2007-06-26
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公开(公告)号: US20080042288A1公开(公告)日: 2008-02-21
- 发明人: Shunpei Yamazaki , Hironobu Shoji , Ikuko Kawamata
- 申请人: Shunpei Yamazaki , Hironobu Shoji , Ikuko Kawamata
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 优先权: JP2006-184719 20060704
- 主分类号: H01L23/485
- IPC分类号: H01L23/485 ; H01L21/44
摘要:
When a conductive layer is formed, a first liquid composition containing a conductive material is applied on an outer side of a pattern that is desired to be formed (corresponding to a contour or an edge portion of a pattern), and a first conductive layer (insulating layer) having a frame-shape is formed. A second liquid composition containing a conductive material is applied so as to fill a space inside the first conductive layer having a frame-shape, whereby a second conductive layer is formed. The first conductive layer and the second conductive layer are formed so as to be in contact with each other, and the first conductive layer is formed so as to surround the second conductive layer. Therefore, the first conductive layer and the second conductive layer can be used as one continuous conductive layer.
公开/授权文献
- US07768617B2 Method for manufacturing a semiconductor device 公开/授权日:2010-08-03
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