Invention Application
- Patent Title: Gas-Filled Discharge Gap
- Patent Title (中): 气体放电缺口
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Application No.: US11859586Application Date: 2007-09-21
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Publication No.: US20080048545A1Publication Date: 2008-02-28
- Inventor: Juergen Boy , Wolfgang Daeumer , Frank Werner
- Applicant: Juergen Boy , Wolfgang Daeumer , Frank Werner
- Priority: DE102005013499.8 20050323
- Main IPC: H01J63/04
- IPC: H01J63/04
Abstract:
A gas-filled discharge gap includes at least two electrodes and an electrode-activation mass that is arranged on at least one of the electrodes. The electrode-activation mass contains K2WO4.
Public/Granted literature
- US07795810B2 Gas-filled discharge gap Public/Granted day:2010-09-14
Information query
